Inventor
BURNS DOUGLAS H
US21 patents
⚠️ This page may combine multiple inventors who share the name “BURNS DOUGLAS H”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
9 patentsUS8012304B2Sep 6, 2011
Plasma reactor with a multiple zone thermal control feed forward control apparatus
APPLIED MATERIALS INC27 citations96
US8021521B2Sep 20, 2011
Method for agile workpiece temperature control in a plasma reactor using a thermal model
APPLIED MATERIALS INC13 citations92
US7359177B2Apr 15, 2008
Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output
APPLIED MATERIALS INC42 citations92
US7374636B2May 20, 2008
Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor
APPLIED MATERIALS INC21 citations91
US8034180B2Oct 11, 2011
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
APPLIED MATERIALS INC14 citations83
US7988872B2Aug 2, 2011
Method of operating a capacitively coupled plasma reactor with dual temperature control loops
APPLIED MATERIALS INC19 citations83
US7316199B2Jan 8, 2008
Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber
APPLIED MATERIALS INC9 citations83
US7375947B2May 20, 2008
Method of feedback control of ESC voltage using wafer voltage measurement at the bias supply output
APPLIED MATERIALS INC3 citations63
US8048806B2Nov 1, 2011
Methods to avoid unstable plasma states during a process transition
APPLIED MATERIALS INC5 citations62
BUCHBERGER JR DOUGLAS A
6 patentsUS8608900B2Dec 17, 2013
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
BUCHBERGER JR DOUGLAS A18 citations92
US8329586B2Dec 11, 2012
Method of processing a workpiece in a plasma reactor using feed forward thermal control
BUCHBERGER JR DOUGLAS A11 citations92
US8221580B2Jul 17, 2012
Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops
BUCHBERGER JR DOUGLAS A14 citations92
US8157951B2Apr 17, 2012
Capacitively coupled plasma reactor having very agile wafer temperature control
BUCHBERGER JR DOUGLAS A18 citations92
US8092639B2Jan 10, 2012
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
BUCHBERGER JR DOUGLAS A20 citations92
US8337660B2Dec 25, 2012
Capacitively coupled plasma reactor having very agile wafer temperature control
BUCHBERGER JR DOUGLAS A12 citations84
BRILLHART PAUL LUKAS
4 patentsUS8980044B2Mar 17, 2015
Plasma reactor with a multiple zone thermal control feed forward control apparatus
BRILLHART PAUL LUKAS10 citations92
US8546267B2Oct 1, 2013
Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control
BRILLHART PAUL LUKAS5 citations83
US8092638B2Jan 10, 2012
Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution
BRILLHART PAUL LUKAS15 citations83
US8801893B2Aug 12, 2014
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
BRILLHART PAUL LUKAS5 citations72