Inventor
WEN YOUXIAN
US17 patents
⚠️ This page may combine multiple inventors who share the name “WEN YOUXIAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
THERMA WAVE INC
7 patentsUS6898596B2May 24, 2005
Evolution of library data sets
THERMA WAVE INC74 citations96
US6784993B2Aug 31, 2004
Apparatus for optical measurements of nitrogen concentration in thin films
THERMA WAVE INC16 citations92
US6583876B2Jun 24, 2003
Apparatus for optical measurements of nitrogen concentration in thin films
THERMA WAVE INC37 citations92
US7145664B2Dec 5, 2006
Global shape definition method for scatterometry
THERMA WAVE INC20 citations91
US6882421B2Apr 19, 2005
Apparatus for optical measurements of nitrogen concentration in thin films
THERMA WAVE INC9 citations74
US6472238B1Oct 29, 2002
Evaluation of etching processes in semiconductors
THERMA WAVE INC12 citations73
US6989896B2Jan 24, 2006
Standardized sample for characterizing the performance of a scatterometer
THERMA WAVE INC8 citations68
KLA TENCOR CORP
5 patentsUS7478019B2Jan 13, 2009
Multiple tool and structure analysis
KLA TENCOR CORP225 citations98
US9645097B2May 9, 2017
In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning
KLA TENCOR CORP10 citations80
US9658150B2May 23, 2017
System and method for semiconductor wafer inspection and metrology
KLA TENCOR CORP2 citations73
US7613598B2Nov 3, 2009
Global shape definition method for scatterometry
KLA TENCOR CORP5 citations72
US9747520B2Aug 29, 2017
Systems and methods for enhancing inspection sensitivity of an inspection tool
KLA TENCOR CORP5 citations69
TOKYO ELECTRON LTD
4 patentsUS7523439B2Apr 21, 2009
Determining position accuracy of double exposure lithography using optical metrology
TOKYO ELECTRON LTD9 citations84
US7085676B2Aug 1, 2006
Feed forward critical dimension control
TOKYO ELECTRON LTD11 citations84
US7518740B2Apr 14, 2009
Evaluating a profile model to characterize a structure to be examined using optical metrology
TOKYO ELECTRON LTD9 citations82
US7639375B2Dec 29, 2009
Determining transmittance of a photomask using optical metrology
TOKYO ELECTRON LTD0 citations38