Inventor
STEENBRINK STIJN WILLEM HERMAN KAREL
NL29 patents
⚠️ This page may combine multiple inventors who share the name “STEENBRINK STIJN WILLEM HERMAN KAREL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MAPPER LITHOGRAPHY IP BV
7 patentsUS8890094B2Nov 18, 2014
Projection lens arrangement
MAPPER LITHOGRAPHY IP BV6 citations73
US8916837B2Dec 23, 2014
Charged particle lithography system with intermediate chamber
MAPPER LITHOGRAPHY IP BV4 citations71
US7710009B2May 4, 2010
System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission
MAPPER LITHOGRAPHY IP BV2 citations63
US8841920B2Sep 23, 2014
Capacitive sensing system
MAPPER LITHOGRAPHY IP BV3 citations60
USRE45552EJun 9, 2015
Lithography system and projection method
MAPPER LITHOGRAPHY IP BV0 citations52
US8759787B2Jun 24, 2014
Charged particle multi-beamlet lithography system with modulation device
MAPPER LITHOGRAPHY IP BV0 citations52
USRE46452EJun 27, 2017
Electrostatic lens structure
MAPPER LITHOGRAPHY IP BV1 citations48
WIELAND MARCO JAN-JACO
5 patentsUS8618496B2Dec 31, 2013
Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams
WIELAND MARCO JAN-JACO38 citations91
US8492731B2Jul 23, 2013
Charged particle multi-beamlet lithography system with modulation device
WIELAND MARCO JAN-JACO9 citations83
US8604411B2Dec 10, 2013
Charged particle beam modulator
WIELAND MARCO JAN-JACO6 citations72
US8921758B2Dec 30, 2014
Modulation device and charged particle multi-beamlet lithography system using the same
WIELAND MARCO JAN-JACO4 citations71
US8841636B2Sep 23, 2014
Modulation device and charged particle multi-beamlet lithography system using the same
WIELAND MARCO JAN-JACO2 citations62
KRUIT PIETER
4 patentsUS8134135B2Mar 13, 2012
Multiple beam charged particle optical system
KRUIT PIETER43 citations96
US8598545B2Dec 3, 2013
Multiple beam charged particle optical system
KRUIT PIETER4 citations72
US8188450B2May 29, 2012
Multiple beam charged particle optical system
KRUIT PIETER4 citations72
US8648318B2Feb 11, 2014
Multiple beam charged particle optical system
KRUIT PIETER2 citations61
STEENBRINK STIJN WILLEM HERMAN KAREL
4 patentsUS8198602B2Jun 12, 2012
Electrostatic lens structure
STEENBRINK STIJN WILLEM HERMAN KAREL22 citations88
US8890095B2Nov 18, 2014
Reliability in a maskless lithography system
STEENBRINK STIJN WILLEM HERMAN KAREL2 citations62
US8263942B2Sep 11, 2012
System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission
STEENBRINK STIJN WILLEM HERMAN KAREL1 citations62
US8247958B2Aug 21, 2012
System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission
STEENBRINK STIJN WILLEM HERMAN KAREL0 citations51