Inventor

KIKUCHI AKIOU

JP18 patents

⚠️ This page may combine multiple inventors who share the name “KIKUCHI AKIOU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KIKUCHI AKIOU

CENTRAL GLASS CO LTD

Dry etching method

Method for removing adhering matter and dry etching method

Silicon dry etching method

Method for producing tungsten hexafluoride

Surface treatment method, dry etching method, cleaning method, semiconductor device manufacturing method, and etching device

Metal material, method of producing metal material, method of passivating semiconductor processing apparatus, method of manufacturing semiconductor device, and method of manufacturing filled container

Dry etching agent and dry etching method using the same

IF7-derived iodine fluoride compound recovery method and recovery device

Gas generation device

MORI ISAMU

Method for synthesizing fluorine compound by electrolysis and electrode therefor

Method for producing oxygen-containing halogenated fluoride

KIKUCHI AKIOU

Method and device for measuring water content in hydrogen fluoride-containing fluoride salt compounds

Fluorine gas generating apparatus

UMEZAKI TOMONORI

Dry etching agent and dry etching method

HITACHI INT ELECTRIC INC

Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, and a non-transitory computer-readable recording medium

SCREEN HOLDINGS CO LTD

Sacrificial-film removal method and substrate processing device

KIMURA MASAHIRO

Pattern forming method

HIBINO YASUO

Dry etching agent and dry etching method using the same