Inventor
KENNEY JASON A
US16 patents
Patents
16 patentsUSD797691SSep 19, 2017
Composite edge ring
APPLIED MATERIALS INC59 citations97
US10249470B2Apr 2, 2019
Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shielding
APPLIED MATERIALS INC10 citations84
US10170279B2Jan 1, 2019
Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding
APPLIED MATERIALS INC11 citations84
US9745663B2Aug 29, 2017
Symmetrical inductively coupled plasma source with symmetrical flow chamber
APPLIED MATERIALS INC8 citations84
US9082590B2Jul 14, 2015
Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates
APPLIED MATERIALS INC8 citations84
US10811226B2Oct 20, 2020
Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates
APPLIED MATERIALS INC4 citations73
US10131994B2Nov 20, 2018
Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow
APPLIED MATERIALS INC4 citations73
US9928987B2Mar 27, 2018
Inductively coupled plasma source with symmetrical RF feed
APPLIED MATERIALS INC5 citations73
US9896769B2Feb 20, 2018
Inductively coupled plasma source with multiple dielectric windows and window-supporting structure
APPLIED MATERIALS INC4 citations73
US9870897B2Jan 16, 2018
Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates
APPLIED MATERIALS INC4 citations73
US9449794B2Sep 20, 2016
Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antenna
APPLIED MATERIALS INC5 citations73
US9111722B2Aug 18, 2015
Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator
APPLIED MATERIALS INC6 citations73
US9082591B2Jul 14, 2015
Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator
APPLIED MATERIALS INC4 citations73
US11551965B2Jan 10, 2023
Apparatus to reduce polymers deposition
APPLIED MATERIALS INC0 citations61
US11049760B2Jun 29, 2021
Universal process kit
APPLIED MATERIALS INC0 citations52
US12237149B2Feb 25, 2025
Reducing aspect ratio dependent etch with direct current bias pulsing
APPLIED MATERIALS INC0 citations43