Inventor
LEIPOLD WILLIAM C
US32 patents
⚠️ This page may combine multiple inventors who share the name “LEIPOLD WILLIAM C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
31 patentsUS6662350B2Dec 9, 2003
FinFET layout generation
IBM291 citations99
US6425112B1Jul 23, 2002
Auto correction of error checked simulated printed images
IBM235 citations98
US5923563AJul 13, 1999
Variable density fill shape generation
IBM119 citations98
US6373975B1Apr 16, 2002
Error checking of simulated printed images with process window effects included
IBM87 citations97
US7353472B2Apr 1, 2008
System and method for testing pattern sensitive algorithms for semiconductor design
IBM14 citations92
US7312141B2Dec 25, 2007
Shapes-based migration of aluminum designs to copper damascene
IBM14 citations92
US7257247B2Aug 14, 2007
Mask defect analysis system
IBM13 citations92
US6948146B2Sep 20, 2005
Simplified tiling pattern method
IBM20 citations92
US6704695B1Mar 9, 2004
Interactive optical proximity correction design method
IBM24 citations92
US6539321B2Mar 25, 2003
Method for edge bias correction of topography-induced linewidth variation
IBM22 citations92
US6528883B1Mar 4, 2003
Shapes-based migration of aluminum designs to copper damascene
IBM31 citations92
US6395438B1May 28, 2002
Method of etch bias proximity correction
IBM33 citations92
US6261724B1Jul 17, 2001
Method of modifying a microchip layout data set to generate a predicted mask printed data set
IBM20 citations92
US6823496B2Nov 23, 2004
Physical design characterization system
IBM26 citations90
US7404174B2Jul 22, 2008
method for generating a set of test patterns for an optical proximity correction algorithm
IBM11 citations84
US6992002B2Jan 31, 2006
Shapes-based migration of aluminum designs to copper damascence
IBM12 citations84
US7051307B2May 23, 2006
Autonomic graphical partitioning
IBM17 citations83
US7584077B2Sep 1, 2009
Physical design characterization system
IBM11 citations80
US7284230B2Oct 16, 2007
System for search and analysis of systematic defects in integrated circuits
IBM6 citations73
US7709967B2May 4, 2010
Shapes-based migration of aluminum designs to copper damascene
IBM1 citations62
US7498250B2Mar 3, 2009
Shapes-based migration of aluminum designs to copper damascene
IBM2 citations62
US7492941B2Feb 17, 2009
Mask defect analysis system
IBM3 citations62
US7492940B2Feb 17, 2009
Mask defect analysis system
IBM2 citations62
US7415695B2Aug 19, 2008
System for search and analysis of systematic defects in integrated circuits
IBM3 citations62
US6667136B2Dec 23, 2003
Method to control nested to isolated line printing
IBM5 citations62
US6458493B2Oct 1, 2002
Method to control nested to isolated line printing
IBM4 citations62
US6429469B1Aug 6, 2002
Optical Proximity Correction Structures Having Decoupling Capacitors
IBM5 citations62
US6258490B1Jul 10, 2001
Transmission control mask utilized to reduce foreshortening effects
IBM6 citations62
US6760901B2Jul 6, 2004
Trough adjusted optical proximity correction for vias
IBM2 citations61
US7685544B2Mar 23, 2010
Testing pattern sensitive algorithms for semiconductor design
IBM0 citations51
US7552417B2Jun 23, 2009
System for search and analysis of systematic defects in integrated circuits
IBM0 citations51