Inventor
OHMOTO YUTAKA
JP19 patents
⚠️ This page may combine multiple inventors who share the name “OHMOTO YUTAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
10 patentsUS7288166B2Oct 30, 2007
Plasma processing apparatus
HITACHI LTD6 citations74
US6759338B2Jul 6, 2004
Plasma processing apparatus and method
HITACHI LTD9 citations74
US6649021B2Nov 18, 2003
Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield
HITACHI LTD9 citations74
US6328845B1Dec 11, 2001
Plasma-processing method and an apparatus for carrying out the same
HITACHI LTD8 citations73
US7608162B2Oct 27, 2009
Plasma processing apparatus and method
HITACHI LTD4 citations63
US7014787B2Mar 21, 2006
Etching method of organic insulating film
HITACHI LTD2 citations63
US6867144B2Mar 15, 2005
Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield
HITACHI LTD3 citations63
US6793833B2Sep 21, 2004
Etching method of organic insulating film
HITACHI LTD2 citations63
US6413876B1Jul 2, 2002
Method for plasma processing high-speed semiconductor circuits with increased yield
HITACHI LTD1 citations63
US7396481B2Jul 8, 2008
Etching method of organic insulating film
HITACHI LTD0 citations52
HITACHI HIGH TECH CORP
5 patentsUS10141165B2Nov 27, 2018
Plasma processing apparatus and sample stage thereof
HITACHI HIGH TECH CORP2 citations70
US7009714B2Mar 7, 2006
Method of dry etching a sample and dry etching system
HITACHI HIGH TECH CORP7 citations70
US7122479B2Oct 17, 2006
Etching processing method
HITACHI HIGH TECH CORP4 citations60
US10796890B2Oct 6, 2020
Plasma processing apparatus and sample stage thereof
HITACHI HIGH TECH CORP0 citations49
US7026252B2Apr 11, 2006
Etching aftertreatment method
HITACHI HIGH TECH CORP0 citations39