Inventor
KAKIZAKI YUKIO
JP20 patents
⚠️ This page may combine multiple inventors who share the name “KAKIZAKI YUKIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIPPON KOGAKU KK
10 patentsUS5337097AAug 9, 1994
Projection optical apparatus
NIPPON KOGAKU KK83 citations96
US4770531ASep 13, 1988
Stage device with levelling mechanism
NIPPON KOGAKU KK91 citations96
US4655584AApr 7, 1987
Substrate positioning apparatus
NIPPON KOGAKU KK66 citations96
US4716299ADec 29, 1987
Apparatus for conveying and inspecting a substrate
NIPPON KOGAKU KK25 citations92
US4113223ASep 12, 1978
Cross-movable carriage
NIPPON KOGAKU KK41 citations92
US4422547ADec 27, 1983
Container for holding substrate
NIPPON KOGAKU KK46 citations91
US4776693AOct 11, 1988
Foreign substance inspecting system including a calibration standard
NIPPON KOGAKU KK15 citations74
US4723846AFeb 9, 1988
Optical path length compensating optical system in an alignment apparatus
NIPPON KOGAKU KK3 citations60
USRE37352ESep 4, 2001
Projection optical apparatus
NIPPON KOGAKU KK0 citations42
US4537501AAug 27, 1985
Apparatus for the attitude control of plate-form body
NIPPON KOGAKU KK0 citations40
NIKON CORP
9 patentsUS6040096AMar 21, 2000
Mask substrate, projection exposure apparatus equipped with the mask substrate, and a pattern formation method utilizing the projection exposure apparatus
NIKON CORP120 citations97
US5894056AApr 13, 1999
Mask substrate, projection exposure apparatus equipped with the mask substrate, and a pattern formation method utilizing the projection exposure apparatus
NIKON CORP91 citations96
US5617211AApr 1, 1997
Exposure apparatus
NIKON CORP60 citations95
US4803373AFeb 7, 1989
Conveyor arm apparatus with gap detection
NIKON CORP53 citations92
US6583597B2Jun 24, 2003
Stage apparatus including non-containing gas bearings and microlithography apparatus comprising same
NIKON CORP32 citations91
US6570641B2May 27, 2003
Projection exposure apparatus
NIKON CORP6 citations74
US6049372AApr 11, 2000
Exposure apparatus
NIKON CORP10 citations74
US5929973AJul 27, 1999
Apparatus and method for simultaneously transferring a mask pattern to both sides of a substrate
NIKON CORP14 citations73
US6317196B1Nov 13, 2001
Projection exposure apparatus
NIKON CORP3 citations58