Inventor
BARBEE STEVEN G
US32 patents
⚠️ This page may combine multiple inventors who share the name “BARBEE STEVEN G”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
30 patentsUS5559428ASep 24, 1996
In-situ monitoring of the change in thickness of films
IBM258 citations99
US4400715AAug 23, 1983
Thin film semiconductor device and method for manufacture
IBM294 citations97
US5220405AJun 15, 1993
Interferometer for in situ measurement of thin film thickness changes
IBM65 citations96
US4717596AJan 5, 1988
Method for vacuum vapor deposition with improved mass flow control
IBM138 citations95
US4640221AFeb 3, 1987
Vacuum deposition system with improved mass flow control
IBM113 citations93
US6858532B2Feb 22, 2005
Low defect pre-emitter and pre-base oxide etch for bipolar transistors and related tooling
IBM44 citations92
US5582746ADec 10, 1996
Real time measurement of etch rate during a chemical etching process
IBM19 citations92
US5573624ANov 12, 1996
Chemical etch monitor for measuring film etching uniformity during a chemical etching process
IBM26 citations92
US5501766AMar 26, 1996
Minimizing overetch during a chemical etching process
IBM26 citations92
US5456788AOct 10, 1995
Method and apparatus for contactless real-time in-situ monitoring of a chemical etching process
IBM25 citations92
US5445705AAug 29, 1995
Method and apparatus for contactless real-time in-situ monitoring of a chemical etching process
IBM22 citations92
US5392124AFeb 21, 1995
Method and apparatus for real-time, in-situ endpoint detection and closed loop etch process control
IBM52 citations92
US5386121AJan 31, 1995
In situ, non-destructive CVD surface monitor
IBM24 citations92
US5381234AJan 10, 1995
Method and apparatus for real-time film surface detection for large area wafers
IBM36 citations92
US5338390AAug 16, 1994
Contactless real-time in-situ monitoring of a chemical etching process
IBM32 citations92
US4781970ANov 1, 1988
Strengthening a ceramic by post sinter coating with a compressive surface layer
IBM28 citations92
US5614247AMar 25, 1997
Apparatus for chemical vapor deposition of aluminum oxide
IBM32 citations91
US5516399AMay 14, 1996
Contactless real-time in-situ monitoring of a chemical etching
IBM40 citations91
US5540777AJul 30, 1996
Aluminum oxide LPCVD system
IBM17 citations81
US7502658B1Mar 10, 2009
Methods of fabricating optimization involving process sequence analysis
IBM9 citations76
US5573623ANov 12, 1996
Apparatus for contactless real-time in-situ monitoring of a chemical etching process
IBM7 citations74
US5480511AJan 2, 1996
Method for contactless real-time in-situ monitoring of a chemical etching process
IBM13 citations74
US5451289ASep 19, 1995
Fixture for in-situ noncontact monitoring of wet chemical etching with passive wafer restraint
IBM15 citations74
US5134963AAug 4, 1992
LPCVD reactor for high efficiency, high uniformity deposition
IBM15 citations74
US6878629B1Apr 12, 2005
Method for detecting CMP endpoint in acidic slurries
IBM8 citations73
US5500073AMar 19, 1996
Real time measurement of etch rate during a chemical etching process
IBM15 citations73
US5489361AFeb 6, 1996
Measuring film etching uniformity during a chemical etching process
IBM15 citations73
US6989683B2Jan 24, 2006
Enhanced endpoint detection for wet etch process control
IBM3 citations63
US6843880B2Jan 18, 2005
Enhanced endpoint detection for wet etch process control
IBM1 citations52
US7895168B2Feb 22, 2011
Data mining using variable rankings and enhanced visualization methods
IBM1 citations45