Inventor
HEINZ TONY F
US17 patents
Patents
17 patentsUS5559428ASep 24, 1996
In-situ monitoring of the change in thickness of films
IBM258 citations99
US5294289AMar 15, 1994
Detection of interfaces with atomic resolution during material processing by optical second harmonic generation
IBM113 citations93
US5582746ADec 10, 1996
Real time measurement of etch rate during a chemical etching process
IBM19 citations92
US5573624ANov 12, 1996
Chemical etch monitor for measuring film etching uniformity during a chemical etching process
IBM26 citations92
US5501766AMar 26, 1996
Minimizing overetch during a chemical etching process
IBM26 citations92
US5456788AOct 10, 1995
Method and apparatus for contactless real-time in-situ monitoring of a chemical etching process
IBM25 citations92
US5445705AAug 29, 1995
Method and apparatus for contactless real-time in-situ monitoring of a chemical etching process
IBM22 citations92
US5392124AFeb 21, 1995
Method and apparatus for real-time, in-situ endpoint detection and closed loop etch process control
IBM52 citations92
US5386121AJan 31, 1995
In situ, non-destructive CVD surface monitor
IBM24 citations92
US5381234AJan 10, 1995
Method and apparatus for real-time film surface detection for large area wafers
IBM36 citations92
US5338390AAug 16, 1994
Contactless real-time in-situ monitoring of a chemical etching process
IBM32 citations92
US5516399AMay 14, 1996
Contactless real-time in-situ monitoring of a chemical etching
IBM40 citations91
US5573623ANov 12, 1996
Apparatus for contactless real-time in-situ monitoring of a chemical etching process
IBM7 citations74
US5480511AJan 2, 1996
Method for contactless real-time in-situ monitoring of a chemical etching process
IBM13 citations74
US5451289ASep 19, 1995
Fixture for in-situ noncontact monitoring of wet chemical etching with passive wafer restraint
IBM15 citations74
US5500073AMar 19, 1996
Real time measurement of etch rate during a chemical etching process
IBM15 citations73
US5489361AFeb 6, 1996
Measuring film etching uniformity during a chemical etching process
IBM15 citations73