Inventor
ABRAHAM MARGARET H
US12 patents
⚠️ This page may combine multiple inventors who share the name “ABRAHAM MARGARET H”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
AEROSPACE CORP
7 patentsUS6410362B1Jun 25, 2002
Flexible thin film solar cell
AEROSPACE CORP40 citations89
US7419915B2Sep 2, 2008
Laser assisted chemical etching method for release microscale and nanoscale devices
AEROSPACE CORP12 citations83
US8368155B2Feb 5, 2013
Systems and methods for preparing freestanding films using laser-assisted chemical etch, and freestanding films formed using same
AEROSPACE CORP6 citations82
US7419917B2Sep 2, 2008
Ion implanted microscale and nanoscale device method
AEROSPACE CORP8 citations72
US9679779B2Jun 13, 2017
Systems and methods for depositing materials on either side of a freestanding film using selective thermally-assisted chemical vapor deposition (STA-CVD), and structures formed using same
AEROSPACE CORP3 citations71
US9048179B2Jun 2, 2015
Systems and methods for preparing films using sequential ion implantation, and films formed using same
AEROSPACE CORP1 citations61
US6494402B2Dec 17, 2002
Lateral exhaust microthruster
AEROSPACE CORP2 citations60
ABRAHAM MARGARET H
5 patentsUS9583354B2Feb 28, 2017
Systems and methods for depositing materials on either side of a freestanding film using laser-assisted chemical vapor deposition (LA-CVD), and structures formed using same
ABRAHAM MARGARET H3 citations71
US8625064B2Jan 7, 2014
Systems and methods for preparing films using sequential ion implantation, and films formed using same
ABRAHAM MARGARET H3 citations60
US8269931B2Sep 18, 2012
Systems and methods for preparing films using sequential ion implantation, and films formed using same
ABRAHAM MARGARET H4 citations60
US8946864B2Feb 3, 2015
Systems and methods for preparing films comprising metal using sequential ion implantation, and films formed using same
ABRAHAM MARGARET H0 citations50
US8866240B2Oct 21, 2014
System and methods for preparing freestanding films using laser-assisted chemical etch, and freestanding films formed using same
ABRAHAM MARGARET H0 citations50