Inventor
YOO MING-HUA
TW3 patents
Patents
3 patentsUS6660638B1Dec 9, 2003
CMP process leaving no residual oxide layer or slurry particles
TAIWAN SEMICONDUCTOR MFG13 citations91
US7125802B2Oct 24, 2006
CMP process leaving no residual oxide layer or slurry particles
TAIWAN SEMICONDUCTOR MFG3 citations61
US6903019B2Jun 7, 2005
CMP process leaving no residual oxide layer or slurry particles
TAIWAN SEMICONDUCTOR MFG0 citations51