Inventor
HIDESAKA SHINICHI
JP10 patents
Patents
10 patentsUS7927780B2Apr 19, 2011
Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator
TOKYO OHKA KOGYO CO LTD9 citations83
US6551755B2Apr 22, 2003
Positive photoresist composition
TOKYO OHKA KOGYO CO LTD7 citations72
US5702862ADec 30, 1997
Positive photoresist coating solution comprising a mixed solvent of propylene glycol monopropyl ether and 2-heptanone
TOKYO OHKA KOGYO CO LTD6 citations71
US7582406B2Sep 1, 2009
Resist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD3 citations62
US6312863B1Nov 6, 2001
Positive photoresist composition
TOKYO OHKA KOGYO CO LTD5 citations62
US7781144B2Aug 24, 2010
Positive resist composition and resist pattern forming method
TOKYO OHKA KOGYO CO LTD5 citations61
US8367297B2Feb 5, 2013
Resist composition, method of forming resist pattern, novel compound and acid generator
TOKYO OHKA KOGYO CO LTD3 citations60
US7858286B2Dec 28, 2010
Positive resist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations40
US7329478B2Feb 12, 2008
Chemical amplified positive photo resist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations40
US9740105B2Aug 22, 2017
Resist pattern formation method and resist composition
TOKYO OHKA KOGYO CO LTD0 citations33