P

Inventor

NITTA KAZUYUKI

JP32 patents
⚠️ This page may combine multiple inventors who share the name “NITTA KAZUYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO OHKA KOGYO CO LTD

30 patents
US5945517AAug 31, 1999

Chemical-sensitization photoresist composition

TOKYO OHKA KOGYO CO LTD305 citations96
US5736296AApr 7, 1998

Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound

TOKYO OHKA KOGYO CO LTD46 citations96
US5955240ASep 21, 1999

Positive resist composition

TOKYO OHKA KOGYO CO LTD23 citations92
US5948589ASep 7, 1999

Positive-working photoresist composition

TOKYO OHKA KOGYO CO LTD20 citations92
US5908730AJun 1, 1999

Chemical-sensitization photoresist composition

TOKYO OHKA KOGYO CO LTD35 citations92
US5817444AOct 6, 1998

Positive-working photoresist composition and multilayered resist material using the same

TOKYO OHKA KOGYO CO LTD35 citations92
US5800964ASep 1, 1998

Photoresist composition

TOKYO OHKA KOGYO CO LTD20 citations92
US7358028B2Apr 15, 2008

Chemically amplified positive photo resist composition and method for forming resist pattern

TOKYO OHKA KOGYO CO LTD10 citations83
US6605417B2Aug 12, 2003

Method for decreasing surface defects of patterned resist layer

TOKYO OHKA KOGYO CO LTD14 citations82
US5770343AJun 23, 1998

Positive-working photoresist composition

TOKYO OHKA KOGYO CO LTD15 citations82
US6159652ADec 12, 2000

Positive resist composition

TOKYO OHKA KOGYO CO LTD12 citations73
US5945248AAug 31, 1999

Chemical-sensitization positive-working photoresist composition

TOKYO OHKA KOGYO CO LTD14 citations73
US5874195AFeb 23, 1999

Positive-working photoresist composition

TOKYO OHKA KOGYO CO LTD9 citations73
US6638684B2Oct 28, 2003

Photosensitive laminate, process for forming resist pattern using same and positive resist composition

TOKYO OHKA KOGYO CO LTD7 citations72
US5728504AMar 17, 1998

Positive photoresist compositions and multilayer resist materials using the same

TOKYO OHKA KOGYO CO LTD15 citations72
US6921621B2Jul 26, 2005

Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device

TOKYO OHKA KOGYO CO LTD9 citations71
US6818380B2Nov 16, 2004

Method for the preparation of a semiconductor device

TOKYO OHKA KOGYO CO LTD4 citations62
US6787290B2Sep 7, 2004

Positive-working photoresist composition and resist patterning method using same

TOKYO OHKA KOGYO CO LTD6 citations62
US6777158B2Aug 17, 2004

Method for the preparation of a semiconductor device

TOKYO OHKA KOGYO CO LTD3 citations62
US6444394B1Sep 3, 2002

Positive-working photoresist composition

TOKYO OHKA KOGYO CO LTD5 citations62
US5856058AJan 5, 1999

Chemical-sensitization positive-working photoresist composition

TOKYO OHKA KOGYO CO LTD2 citations62
US5854357ADec 29, 1998

Process for the production of polyhydroxstyrene

TOKYO OHKA KOGYO CO LTD3 citations62
US7402372B2Jul 22, 2008

Positive resist composition and method of forming resist pattern

TOKYO OHKA KOGYO CO LTD5 citations61
US7150956B2Dec 19, 2006

Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device

TOKYO OHKA KOGYO CO LTD3 citations60
US7407739B2Aug 5, 2008

Resist developer and resist pattern formation method using same

TOKYO OHKA KOGYO CO LTD0 citations52
US7094924B2Aug 22, 2006

Method for decreasing surface defects of patterned resist layer

TOKYO OHKA KOGYO CO LTD1 citations51
US6677103B2Jan 13, 2004

Positive-working photoresist composition

TOKYO OHKA KOGYO CO LTD1 citations51
USRE38254ESep 16, 2003

Positive resist composition

TOKYO OHKA KOGYO CO LTD1 citations48
US7329478B2Feb 12, 2008

Chemical amplified positive photo resist composition and method for forming resist pattern

TOKYO OHKA KOGYO CO LTD0 citations40
US7192687B2Mar 20, 2007

Positive resist composition and method of forming resist pattern using same

TOKYO OHKA KOGYO CO LTD0 citations40

NITTA KAZUYUKI

1 patent

FUJITA SHOICHI

1 patent