Inventor
KAWAHARA HIRONOBU
JP39 patents
⚠️ This page may combine multiple inventors who share the name “KAWAHARA HIRONOBU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
36 patentsUS4795529AJan 3, 1989
Plasma treating method and apparatus therefor
HITACHI LTD184 citations97
US5868854AFeb 9, 1999
Method and apparatus for processing samples
HITACHI LTD67 citations96
US5007981AApr 16, 1991
Method of removing residual corrosive compounds by plasma etching followed by washing
HITACHI LTD106 citations96
US5556714ASep 17, 1996
Method of treating samples
HITACHI LTD68 citations95
US5380397AJan 10, 1995
Method of treating samples
HITACHI LTD35 citations95
US5110408AMay 5, 1992
Process for etching
HITACHI LTD95 citations95
US4985113AJan 15, 1991
Sample treating method and apparatus
HITACHI LTD55 citations94
US6624084B2Sep 23, 2003
Plasma processing equipment and plasma processing method using the same
HITACHI LTD47 citations92
US6549393B2Apr 15, 2003
Semiconductor wafer processing apparatus and method
HITACHI LTD19 citations92
US6537415B2Mar 25, 2003
Apparatus for processing samples
HITACHI LTD17 citations92
US6427621B1Aug 6, 2002
Plasma processing device and plasma processing method
HITACHI LTD42 citations92
US6235146B1May 22, 2001
Vacuum treatment system and its stage
HITACHI LTD22 citations92
US5320707AJun 14, 1994
Dry etching method
HITACHI LTD27 citations92
US5200017AApr 6, 1993
Sample processing method and apparatus
HITACHI LTD38 citations92
US5861601AJan 19, 1999
Microwave plasma processing apparatus and method
HITACHI LTD45 citations88
US7288166B2Oct 30, 2007
Plasma processing apparatus
HITACHI LTD6 citations74
US6759338B2Jul 6, 2004
Plasma processing apparatus and method
HITACHI LTD9 citations74
US6649021B2Nov 18, 2003
Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield
HITACHI LTD9 citations74
US6537012B2Mar 25, 2003
Vacuum processing apparatus and a vacuum processing system
HITACHI LTD11 citations74
US6388624B1May 14, 2002
Parallel-planar plasma processing apparatus
HITACHI LTD10 citations74
US6165377ADec 26, 2000
Plasma etching method and apparatus
HITACHI LTD9 citations74
US5952245ASep 14, 1999
Method for processing samples
HITACHI LTD7 citations74
US5900162AMay 4, 1999
Plasma etching method and apparatus
HITACHI LTD12 citations74
US6537417B2Mar 25, 2003
Apparatus for processing samples
HITACHI LTD6 citations73
US6329298B1Dec 11, 2001
Apparatus for treating samples
HITACHI LTD8 citations73
US6254721B1Jul 3, 2001
Method and apparatus for processing samples
HITACHI LTD6 citations73
US6036816AMar 14, 2000
Apparatus for processing a sample having a metal laminate
HITACHI LTD8 citations73
US7608162B2Oct 27, 2009
Plasma processing apparatus and method
HITACHI LTD4 citations63
US6867144B2Mar 15, 2005
Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield
HITACHI LTD3 citations63
US6755935B2Jun 29, 2004
Plasma processing apparatus
HITACHI LTD5 citations63
US6558100B1May 6, 2003
Vacuum processing apparatus and a vacuum processing system
HITACHI LTD4 citations63
US6413876B1Jul 2, 2002
Method for plasma processing high-speed semiconductor circuits with increased yield
HITACHI LTD1 citations63
US6077788AJun 20, 2000
Method and apparatus for processing samples
HITACHI LTD5 citations63
US6989228B2Jan 24, 2006
Method and apparatus for processing samples
HITACHI LTD3 citations62
US6656846B2Dec 2, 2003
Apparatus for processing samples
HITACHI LTD2 citations62
US7132293B2Nov 7, 2006
Method and apparatus for processing samples
HITACHI LTD1 citations52