Inventor
WANG HUEY-MING
US20 patents
⚠️ This page may combine multiple inventors who share the name “WANG HUEY-MING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MULTI PLANAR TECHNOLOGIES INC
6 patentsUS6558232B1May 6, 2003
System and method for CMP having multi-pressure zone loading for improved edge and annular zone material removal control
MULTI PLANAR TECHNOLOGIES INC92 citations96
US6506105B1Jan 14, 2003
System and method for pneumatic diaphragm CMP head having separate retaining ring and multi-region wafer pressure control
MULTI PLANAR TECHNOLOGIES INC105 citations96
US6893327B2May 17, 2005
Chemical mechanical polishing apparatus and method having a retaining ring with a contoured surface
MULTI PLANAR TECHNOLOGIES INC42 citations92
US6540590B1Apr 1, 2003
Chemical mechanical polishing apparatus and method having a rotating retaining ring
MULTI PLANAR TECHNOLOGIES INC26 citations92
US6966822B2Nov 22, 2005
System and method for CMP having multi-pressure zone loading for improved edge and annular zone material removal control
MULTI PLANAR TECHNOLOGIES INC18 citations91
US6623343B2Sep 23, 2003
System and method for CMP head having multi-pressure annular zone subcarrier material removal control
MULTI PLANAR TECHNOLOGIES INC51 citations91
GLOBALFOUNDRIES INC
5 patentsUS8877580B1Nov 4, 2014
Reduction of oxide recesses for gate height control
GLOBALFOUNDRIES INC13 citations83
US9257516B2Feb 9, 2016
Reduction of oxide recesses for gate height control
GLOBALFOUNDRIES INC0 citations51
US8927356B1Jan 6, 2015
Removal of nitride bump in opening replacement gate structure
GLOBALFOUNDRIES INC0 citations51
US9349814B2May 24, 2016
Gate height uniformity in semiconductor devices
GLOBALFOUNDRIES INC0 citations50
US9093560B2Jul 28, 2015
Gate height uniformity in semiconductor devices
GLOBALFOUNDRIES INC1 citations50
EBARA TECH INC
4 patentsUS7326103B2Feb 5, 2008
Vertically adjustable chemical mechanical polishing head and method for use thereof
EBARA TECH INC20 citations90
US6916226B2Jul 12, 2005
Chemical mechanical polishing apparatus having a stepped retaining ring and method for use thereof
EBARA TECH INC13 citations79
US7004822B2Feb 28, 2006
Chemical mechanical polishing and pad dressing method
EBARA TECH INC9 citations68
US6913514B2Jul 5, 2005
Chemical mechanical polishing endpoint detection system and method
EBARA TECH INC5 citations62
RODEL INC
3 patentsUS5693239ADec 2, 1997
Polishing slurries comprising two abrasive components and methods for their use
RODEL INC133 citations97
US5770103AJun 23, 1998
Composition and method for polishing a composite comprising titanium
RODEL INC66 citations95
US6001269ADec 14, 1999
Method for polishing a composite comprising an insulator, a metal, and titanium
RODEL INC48 citations92