Inventor
BHATIA SIDHARTH
US27 patents
⚠️ This page may combine multiple inventors who share the name “BHATIA SIDHARTH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
25 patentsUSD1045924SOct 8, 2024
Portion of a display panel with a graphical user interface
APPLIED MATERIALS INC4 citations81
USD1031743SJun 18, 2024
Portion of a display panel with a graphical user interface
APPLIED MATERIALS INC5 citations81
US11328964B2May 10, 2022
Prescriptive analytics in highly collinear response space
APPLIED MATERIALS INC2 citations73
US10748797B2Aug 18, 2020
Plasma parameters and skew characterization by high speed imaging
APPLIED MATERIALS INC2 citations72
US11592812B2Feb 28, 2023
Sensor metrology data integration
APPLIED MATERIALS INC2 citations70
US11853042B2Dec 26, 2023
Part, sensor, and metrology data integration
APPLIED MATERIALS INC2 citations68
US12074073B2Aug 27, 2024
Prescriptive analytics in highly collinear response space
APPLIED MATERIALS INC0 citations62
US11545376B2Jan 3, 2023
Plasma parameters and skew characterization by high speed imaging
APPLIED MATERIALS INC0 citations61
US11495440B2Nov 8, 2022
Plasma density control on substrate edge
APPLIED MATERIALS INC0 citations61
US11120976B2Sep 14, 2021
Apparatus and methods for removing contaminant particles in a plasma process
APPLIED MATERIALS INC0 citations61
US12080519B2Sep 3, 2024
Smart dynamic load simulator for RF power delivery control system
APPLIED MATERIALS INC0 citations60
US12366853B2Jul 22, 2025
Sensor metrology data integration
APPLIED MATERIALS INC0 citations59
USD1045923SOct 8, 2024
Portion of a display panel with a graphical user interface
APPLIED MATERIALS INC0 citations58
US11829873B2Nov 28, 2023
Predictive modeling of a manufacturing process using a set of trained inverted models
APPLIED MATERIALS INC0 citations51
US10714319B2Jul 14, 2020
Apparatus and methods for removing contaminant particles in a plasma process
APPLIED MATERIALS INC0 citations51
US9589773B2Mar 7, 2017
In-situ etch rate determination for chamber clean endpoint
APPLIED MATERIALS INC1 citations51
US10790121B2Sep 29, 2020
Plasma density control on substrate edge
APPLIED MATERIALS INC0 citations50
US12560916B2Feb 24, 2026
Adjusting chamber performance by equipment constant updates
APPLIED MATERIALS INC0 citations49
US12504726B2Dec 23, 2025
Determining equipment constant updates by machine learning
APPLIED MATERIALS INC0 citations49
US12498705B2Dec 16, 2025
Chamber matching by equipment constant updates
APPLIED MATERIALS INC0 citations49
US11157661B2Oct 26, 2021
Process development visualization tool
APPLIED MATERIALS INC0 citations49
US12510878B2Dec 30, 2025
Physically-informed multi-system hardware operating windows
APPLIED MATERIALS INC0 citations47
US12469686B2Nov 11, 2025
Process characterization and correction using optical wall process sensor (OWPS)
APPLIED MATERIALS INC0 citations46
US12467136B2Nov 11, 2025
Process characterization and correction using optical wall process sensor (OWPS)
APPLIED MATERIALS INC0 citations44
US10755903B2Aug 25, 2020
RPS defect reduction by cyclic clean induced RPS cooling
APPLIED MATERIALS INC0 citations39