Inventor
NAKAYAMA HIROYUKI
JP183 patents
⚠️ This page may combine multiple inventors who share the name “NAKAYAMA HIROYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
20 patentsUS7780786B2Aug 24, 2010
Internal member of a plasma processing vessel
TOKYO ELECTRON LTD51 citations98
US6837966B2Jan 4, 2005
Method and apparatus for an improved baffle plate in a plasma processing system
TOKYO ELECTRON LTD84 citations98
US7166200B2Jan 23, 2007
Method and apparatus for an improved upper electrode plate in a plasma processing system
TOKYO ELECTRON LTD49 citations96
US7163585B2Jan 16, 2007
Method and apparatus for an improved optical window deposition shield in a plasma processing system
TOKYO ELECTRON LTD56 citations96
US6798519B2Sep 28, 2004
Method and apparatus for an improved optical window deposition shield in a plasma processing system
TOKYO ELECTRON LTD44 citations96
US7464581B2Dec 16, 2008
Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring
TOKYO ELECTRON LTD11 citations93
US7811428B2Oct 12, 2010
Method and apparatus for an improved optical window deposition shield in a plasma processing system
TOKYO ELECTRON LTD14 citations92
US7299104B2Nov 20, 2007
Substrate processing apparatus and substrate transferring method
TOKYO ELECTRON LTD24 citations92
US7282112B2Oct 16, 2007
Method and apparatus for an improved baffle plate in a plasma processing system
TOKYO ELECTRON LTD18 citations92
US7204912B2Apr 17, 2007
Method and apparatus for an improved bellows shield in a plasma processing system
TOKYO ELECTRON LTD23 citations92
US7166166B2Jan 23, 2007
Method and apparatus for an improved baffle plate in a plasma processing system
TOKYO ELECTRON LTD40 citations92
US7147749B2Dec 12, 2006
Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
TOKYO ELECTRON LTD42 citations92
US7137353B2Nov 21, 2006
Method and apparatus for an improved deposition shield in a plasma processing system
TOKYO ELECTRON LTD32 citations92
US6790289B2Sep 14, 2004
Method of cleaning a plasma processing apparatus
TOKYO ELECTRON LTD22 citations92
US8877002B2Nov 4, 2014
Internal member of a plasma processing vessel
TOKYO ELECTRON LTD7 citations84
US7678226B2Mar 16, 2010
Method and apparatus for an improved bellows shield in a plasma processing system
TOKYO ELECTRON LTD15 citations84
US7663860B2Feb 16, 2010
Electrostatic chuck
TOKYO ELECTRON LTD11 citations84
US7628864B2Dec 8, 2009
Substrate cleaning apparatus and method
TOKYO ELECTRON LTD19 citations84
US7566368B2Jul 28, 2009
Method and apparatus for an improved upper electrode plate in a plasma processing system
TOKYO ELECTRON LTD13 citations84
US7756599B2Jul 13, 2010
Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program
TOKYO ELECTRON LTD10 citations83
SEIKO EPSON CORP
7 patentsUS7604426B2Oct 20, 2009
Paper cutting device and a printer with a paper cutting device
SEIKO EPSON CORP18 citations93
US6155730ADec 5, 2000
Roll paper loading mechanism for a printer
SEIKO EPSON CORP31 citations92
US6022158AFeb 8, 2000
Roll paper loading mechanism for printer
SEIKO EPSON CORP40 citations92
US5971534AOct 26, 1999
Ink cartridge loading mechanism for a printer and a printer having the loading mechanism
SEIKO EPSON CORP33 citations92
US6345782B1Feb 12, 2002
Printer and control method for the same
SEIKO EPSON CORP37 citations91
US6203223B1Mar 20, 2001
Printer
SEIKO EPSON CORP34 citations91
US8747000B2Jun 10, 2014
Paper cutting device and a printer with a paper cutting device
SEIKO EPSON CORP4 citations84
KANSAI PAINT CO LTD
4 patentsUS4275092AJun 23, 1981
Method for producing a plate or sheet useful in planographic printing
KANSAI PAINT CO LTD29 citations91
US3954584AMay 4, 1976
Photopolymerizable vinylurethane liquid composition
KANSAI PAINT CO LTD47 citations90
US4267202AMay 12, 1981
Method for modifying the surface properties of polymer substrates
KANSAI PAINT CO LTD39 citations87
US4001150AJan 4, 1977
Composition for preparing electroconductive resin comprising an unsaturated polyester and phosphoric or sulfonic unsaturated ester
KANSAI PAINT CO LTD32 citations84
HOYA CORP
3 patentsUS8029871B2Oct 4, 2011
Method for producing silica aerogel coating
HOYA CORP17 citations84
US7619821B2Nov 17, 2009
Optical element having anti-reflection coating
HOYA CORP13 citations84
US7684113B2Mar 23, 2010
Imaging device including an optical member having a water-repellent or water/oil-repellent coating, an antireflection coating, an infrared-cutting glass, and a lowpass filter in this order from the side of the lens
HOYA CORP12 citations83
MITSUBISHI ELECTRIC RES LAB
2 patentsMITSUBISHI HEAVY IND LTD
2 patentsMORIYA TSUYOSHI
2 patentsMITSUBISHI ELECTRIC INF TECH
1 patentDAICEL CHEM
1 patentNAKAYAMA EGG KK
1 patentMITSUBISHI ELECTRIC CORP
1 patentHONDA MOTOR CO LTD
1 patentJAPAN ATOMIC ENERGY RES INST
1 patentHASHIMOTO SHUJI
1 patentKONAMI CORP
1 patentNAKAYAMA HIROYUKI
1 patentNISHIMOTO SHINYA
1 patentShowing the top 50 of 183 patents by PatentIndex Score.