P

Inventor

NAKAYAMA HIROYUKI

JP183 patents
⚠️ This page may combine multiple inventors who share the name “NAKAYAMA HIROYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

20 patents
US7780786B2Aug 24, 2010

Internal member of a plasma processing vessel

TOKYO ELECTRON LTD51 citations98
US6837966B2Jan 4, 2005

Method and apparatus for an improved baffle plate in a plasma processing system

TOKYO ELECTRON LTD84 citations98
US7166200B2Jan 23, 2007

Method and apparatus for an improved upper electrode plate in a plasma processing system

TOKYO ELECTRON LTD49 citations96
US7163585B2Jan 16, 2007

Method and apparatus for an improved optical window deposition shield in a plasma processing system

TOKYO ELECTRON LTD56 citations96
US6798519B2Sep 28, 2004

Method and apparatus for an improved optical window deposition shield in a plasma processing system

TOKYO ELECTRON LTD44 citations96
US7464581B2Dec 16, 2008

Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring

TOKYO ELECTRON LTD11 citations93
US7811428B2Oct 12, 2010

Method and apparatus for an improved optical window deposition shield in a plasma processing system

TOKYO ELECTRON LTD14 citations92
US7299104B2Nov 20, 2007

Substrate processing apparatus and substrate transferring method

TOKYO ELECTRON LTD24 citations92
US7282112B2Oct 16, 2007

Method and apparatus for an improved baffle plate in a plasma processing system

TOKYO ELECTRON LTD18 citations92
US7204912B2Apr 17, 2007

Method and apparatus for an improved bellows shield in a plasma processing system

TOKYO ELECTRON LTD23 citations92
US7166166B2Jan 23, 2007

Method and apparatus for an improved baffle plate in a plasma processing system

TOKYO ELECTRON LTD40 citations92
US7147749B2Dec 12, 2006

Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system

TOKYO ELECTRON LTD42 citations92
US7137353B2Nov 21, 2006

Method and apparatus for an improved deposition shield in a plasma processing system

TOKYO ELECTRON LTD32 citations92
US6790289B2Sep 14, 2004

Method of cleaning a plasma processing apparatus

TOKYO ELECTRON LTD22 citations92
US8877002B2Nov 4, 2014

Internal member of a plasma processing vessel

TOKYO ELECTRON LTD7 citations84
US7678226B2Mar 16, 2010

Method and apparatus for an improved bellows shield in a plasma processing system

TOKYO ELECTRON LTD15 citations84
US7663860B2Feb 16, 2010

Electrostatic chuck

TOKYO ELECTRON LTD11 citations84
US7628864B2Dec 8, 2009

Substrate cleaning apparatus and method

TOKYO ELECTRON LTD19 citations84
US7566368B2Jul 28, 2009

Method and apparatus for an improved upper electrode plate in a plasma processing system

TOKYO ELECTRON LTD13 citations84
US7756599B2Jul 13, 2010

Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program

TOKYO ELECTRON LTD10 citations83

SEIKO EPSON CORP

7 patents

KANSAI PAINT CO LTD

4 patents

HOYA CORP

3 patents

MITSUBISHI ELECTRIC RES LAB

2 patents

MITSUBISHI HEAVY IND LTD

2 patents

MORIYA TSUYOSHI

2 patents

MITSUBISHI ELECTRIC INF TECH

1 patent

DAICEL CHEM

1 patent

NAKAYAMA EGG KK

1 patent

MITSUBISHI ELECTRIC CORP

1 patent

HONDA MOTOR CO LTD

1 patent

JAPAN ATOMIC ENERGY RES INST

1 patent

HASHIMOTO SHUJI

1 patent

KONAMI CORP

1 patent

NAKAYAMA HIROYUKI

1 patent

NISHIMOTO SHINYA

1 patent

Showing the top 50 of 183 patents by PatentIndex Score.