Inventor
ROBERTSON ROBERT
US25 patents
⚠️ This page may combine multiple inventors who share the name “ROBERTSON ROBERT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
10 patentsUS5366585ANov 22, 1994
Method and apparatus for protection of conductive surfaces in a plasma processing reactor
APPLIED MATERIALS INC462 citations99
US5589233ADec 31, 1996
Single chamber CVD process for thin film transistors
APPLIED MATERIALS INC124 citations96
US5399387AMar 21, 1995
Plasma CVD of silicon nitride thin films on large area glass substrates at high deposition rates
APPLIED MATERIALS INC127 citations96
US5271972ADec 21, 1993
Method for depositing ozone/TEOS silicon oxide films of reduced surface sensitivity
APPLIED MATERIALS INC428 citations95
US6338874B1Jan 15, 2002
Method for multilayer CVD processing in a single chamber
APPLIED MATERIALS INC59 citations94
US5380566AJan 10, 1995
Method of limiting sticking of body to susceptor in a deposition treatment
APPLIED MATERIALS INC55 citations94
US6444277B1Sep 3, 2002
Method for depositing amorphous silicon thin films onto large area glass substrates by chemical vapor deposition at high deposition rates
APPLIED MATERIALS INC50 citations91
US5861197AJan 19, 1999
Deposition of high quality conformal silicon oxide thin films on glass substrates
APPLIED MATERIALS INC40 citations90
US5851602ADec 22, 1998
Deposition of high quality conformal silicon oxide thin films for the manufacture of thin film transistors
APPLIED MATERIALS INC44 citations90
US5441768AAug 15, 1995
Multi-step chemical vapor deposition method for thin film transistors
APPLIED MATERIALS INC28 citations90