Inventor

MURAOKA HISASHI

JP20 patents

⚠️ This page may combine multiple inventors who share the name “MURAOKA HISASHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MURAOKA HISASHI

PUREX CO LTD

Multifunctional air filter and air-circulating clean unit with the same incorporated therein

Silicon wafer cleaning fluid with HN03, HF, HCl, surfactant, and water

Silicone wafer cleaning method

Treatment method of cleaning surface of plastic molded item

Container for semiconductor wafer sample and method of preparing sample

Method for examination of silicon wafer surface defects

Process for cleaning the interior of semiconductor substrate

TOKYO SHIBAURA ELECTRIC CO

Surface-treating agent adapted for intermediate products of a semiconductor device

Surface-treating agent adapted for intermediate products of a semiconductor device

Method of etching a semiconductor substrate

Apparatus for manufacturing semiconductor devices

Apparatus for producing a semiconductor device

NOMURA MICRO SCIENCE KK

Method of removing contamination adhered to surfaces and apparatus used therefor

Method and apparatus for removing organic films

TOSHIBA KK

Method of and apparatus for removing metallic impurities diffused in a semiconductor substrate

Apparatus used for total reflection fluorescent X-ray analysis on a liquid drop-like sample containing very small amounts of impurities

WAKO PURE CHEM IND LTD

Surface treating cleaning method

UMS CO LTD

Method and apparatus for removing organic films

TOSHIBA CERAMICS CO

Apparatus for producing a silicon single crystal from a silicon melt

TAMA CHEMICALS CO LTD

Method of preventing organic contamination from the atmosphere of electronic device substrates and electronic device substrates treated therewith