Inventor
HARSHBARGER WILLIAM R
US24 patents
⚠️ This page may combine multiple inventors who share the name “HARSHBARGER WILLIAM R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
20 patentsUS6825134B2Nov 30, 2004
Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow
APPLIED MATERIALS INC595 citations99
US6432255B1Aug 13, 2002
Method and apparatus for enhancing chamber cleaning
APPLIED MATERIALS INC436 citations99
US6500356B2Dec 31, 2002
Selectively etching silicon using fluorine without plasma
APPLIED MATERIALS INC67 citations96
US6676761B2Jan 13, 2004
Method and apparatus for dechucking a substrate
APPLIED MATERIALS INC45 citations95
US7160392B2Jan 9, 2007
Method for dechucking a substrate
APPLIED MATERIALS INC33 citations92
US7086918B2Aug 8, 2006
Low temperature process for passivation applications
APPLIED MATERIALS INC34 citations92
US6880561B2Apr 19, 2005
Fluorine process for cleaning semiconductor process chamber
APPLIED MATERIALS INC23 citations92
US6843258B2Jan 18, 2005
On-site cleaning gas generation for process chamber cleaning
APPLIED MATERIALS INC17 citations92
US6451390B1Sep 17, 2002
Deposition of TEOS oxide using pulsed RF plasma
APPLIED MATERIALS INC27 citations92
US6960263B2Nov 1, 2005
Shadow frame with cross beam for semiconductor equipment
APPLIED MATERIALS INC10 citations74
US6863077B2Mar 8, 2005
Method and apparatus for enhanced chamber cleaning
APPLIED MATERIALS INC8 citations74
US6858548B2Feb 22, 2005
Application of carbon doped silicon oxide film to flat panel industry
APPLIED MATERIALS INC7 citations74
US6962732B2Nov 8, 2005
Process for controlling thin film uniformity and products produced thereby
APPLIED MATERIALS INC10 citations73
US6610354B2Aug 26, 2003
Plasma display panel with a low k dielectric layer
APPLIED MATERIALS INC6 citations73
US7915114B2Mar 29, 2011
Low temperature process for TFT fabrication
APPLIED MATERIALS INC6 citations72
US7300829B2Nov 27, 2007
Low temperature process for TFT fabrication
APPLIED MATERIALS INC6 citations72
US6981508B2Jan 3, 2006
On-site cleaning gas generation for process chamber cleaning
APPLIED MATERIALS INC4 citations63
US7122962B2Oct 17, 2006
Plasma display panel with a low K dielectric layer
APPLIED MATERIALS INC2 citations62
US8002896B2Aug 23, 2011
Shadow frame with cross beam for semiconductor equipment
APPLIED MATERIALS INC1 citations52
US6827987B2Dec 7, 2004
Method of reducing an electrostatic charge on a substrate during a PECVD process
APPLIED MATERIALS INC1 citations52