Inventor
LO CHI-HSIN
TW44 patents
⚠️ This page may combine multiple inventors who share the name “LO CHI-HSIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG
33 patentsUS7883917B2Feb 8, 2011
Semiconductor device with bonding pad
TAIWAN SEMICONDUCTOR MFG20 citations92
US7253470B1Aug 7, 2007
Floating gate with unique profile by means of undercutting for split-gate flash memory device
TAIWAN SEMICONDUCTOR MFG27 citations92
US6849387B2Feb 1, 2005
Method for integrating copper process and MIM capacitor for embedded DRAM
TAIWAN SEMICONDUCTOR MFG20 citations92
US5880019AMar 9, 1999
Insitu contact descum for self-aligned contact process
TAIWAN SEMICONDUCTOR MFG43 citations92
US5779927AJul 14, 1998
Modified reflux etcher controlled by pH or conductivity sensing loop
TAIWAN SEMICONDUCTOR MFG37 citations92
US6130149AOct 10, 2000
Approach for aluminum bump process
TAIWAN SEMICONDUCTOR MFG27 citations90
US6071826AJun 6, 2000
Method of manufacturing CMOS image sensor leakage free with double layer spacer
TAIWAN SEMICONDUCTOR MFG38 citations90
US6003526ADec 21, 1999
In-sit chamber cleaning method
TAIWAN SEMICONDUCTOR MFG52 citations87
US7928499B2Apr 19, 2011
Profile of flash memory cells
TAIWAN SEMICONDUCTOR MFG7 citations84
US7667261B2Feb 23, 2010
Split-gate memory cells and fabrication methods thereof
TAIWAN SEMICONDUCTOR MFG9 citations84
US7122424B2Oct 17, 2006
Method for making improved bottom electrodes for metal-insulator-metal crown capacitors
TAIWAN SEMICONDUCTOR MFG16 citations84
US7153755B2Dec 26, 2006
Process to improve programming of memory cells
TAIWAN SEMICONDUCTOR MFG12 citations82
US7297598B2Nov 20, 2007
Process for erase improvement in a non-volatile memory device
TAIWAN SEMICONDUCTOR MFG7 citations74
US6881629B2Apr 19, 2005
Method to make minimal spacing between floating gates in split gate flash
TAIWAN SEMICONDUCTOR MFG7 citations73
US6869837B1Mar 22, 2005
Methods of fabricating a word-line spacer for wide over-etching window on outside diameter (OD) and strong fence
TAIWAN SEMICONDUCTOR MFG11 citations72
US7906418B2Mar 15, 2011
Semiconductor device having substantially planar contacts and body
TAIWAN SEMICONDUCTOR MFG4 citations63
US7652318B2Jan 26, 2010
Split-gate memory cells and fabrication methods thereof
TAIWAN SEMICONDUCTOR MFG3 citations63
US7368779B2May 6, 2008
Hemi-spherical structure and method for fabricating the same
TAIWAN SEMICONDUCTOR MFG4 citations63
US7202130B2Apr 10, 2007
Spacer for a split gate flash memory cell and a memory cell employing the same
TAIWAN SEMICONDUCTOR MFG4 citations63
US7144773B1Dec 5, 2006
Method for preventing trenching in fabricating split gate flash devices
TAIWAN SEMICONDUCTOR MFG3 citations63
US6835640B2Dec 28, 2004
Method of forming a novel composite insulator spacer
TAIWAN SEMICONDUCTOR MFG4 citations63
US7192489B2Mar 20, 2007
Method for polymer residue removal following metal etching
TAIWAN SEMICONDUCTOR MFG2 citations62
US6921695B2Jul 26, 2005
Etching method for forming a square cornered polysilicon wordline electrode
TAIWAN SEMICONDUCTOR MFG3 citations61
US5915202AJun 22, 1999
Blanket etching process for formation of tungsten plugs
TAIWAN SEMICONDUCTOR MFG4 citations58
US5755891AMay 26, 1998
Method for post-etching of metal patterns
TAIWAN SEMICONDUCTOR MFG6 citations58
US6537907B1Mar 25, 2003
Self sidewall aluminum fluoride, (SSWAF), protection
TAIWAN SEMICONDUCTOR MFG5 citations54
US7824998B2Nov 2, 2010
Method of forming a semiconductor capacitor using amorphous carbon
TAIWAN SEMICONDUCTOR MFG1 citations52
US7785966B2Aug 31, 2010
Method for fabricating floating gates structures with reduced and more uniform forward tunneling voltages
TAIWAN SEMICONDUCTOR MFG1 citations52
US7691696B2Apr 6, 2010
Hemi-spherical structure and method for fabricating the same
TAIWAN SEMICONDUCTOR MFG0 citations52
US7586145B2Sep 8, 2009
EEPROM flash memory device with jagged edge floating gate
TAIWAN SEMICONDUCTOR MFG0 citations52
US9257568B2Feb 9, 2016
Structure for flash memory cells
TAIWAN SEMICONDUCTOR MFG0 citations51
US7700473B2Apr 20, 2010
Gated semiconductor device and method of fabricating same
TAIWAN SEMICONDUCTOR MFG1 citations51
US6828186B2Dec 7, 2004
Vertical sidewall profile spacer layer and method for fabrication thereof
TAIWAN SEMICONDUCTOR MFG0 citations39