Inventor
ITOH HITOSHI
JP41 patents
⚠️ This page may combine multiple inventors who share the name “ITOH HITOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
11 patentsUS6287988B1Sep 11, 2001
Semiconductor device manufacturing method, semiconductor device manufacturing apparatus and semiconductor device
TOSHIBA KK573 citations99
US6013575AJan 11, 2000
Method of selectively depositing a metal film
TOSHIBA KK67 citations96
US4817558AApr 4, 1989
Thin-film depositing apparatus
TOSHIBA KK94 citations96
US6165916ADec 26, 2000
Film-forming method and film-forming apparatus
TOSHIBA KK55 citations95
US5620925AApr 15, 1997
Method of manufacturing semiconductor device using a hagolen plasma treatment step
TOSHIBA KK22 citations93
US6252272B1Jun 26, 2001
Semiconductor device, and method of fabricating the same
TOSHIBA KK35 citations92
US5580615ADec 3, 1996
Method of forming a conductive film on an insulating region of a substrate
TOSHIBA KK33 citations92
US5223455AJun 29, 1993
Method of forming refractory metal film
TOSHIBA KK26 citations92
US5990007ANov 23, 1999
Method of manufacturing a semiconductor device
TOSHIBA KK20 citations89
US5211987AMay 18, 1993
Method and apparatus for forming refractory metal films
TOSHIBA KK3 citations63
US4957880ASep 18, 1990
Method for producing semiconductor device including a refractory metal pattern
TOSHIBA KK5 citations63
MATSUMOTO KENJI
6 patentsUS8242015B2Aug 14, 2012
Film forming method and film forming apparatus
MATSUMOTO KENJI21 citations92
US8247321B2Aug 21, 2012
Method of manufacturing semiconductor device, semiconductor device, electronic instrument, semiconductor manufacturing apparatus, and storage medium
MATSUMOTO KENJI12 citations84
US8314004B2Nov 20, 2012
Semiconductor device manufacturing method
MATSUMOTO KENJI4 citations63
US8124492B2Feb 28, 2012
Semiconductor device manufacturing method
MATSUMOTO KENJI2 citations63
US8865590B2Oct 21, 2014
Film forming method, pretreatment device, and processing system
MATSUMOTO KENJI3 citations62
US9266146B2Feb 23, 2016
Film forming method and processing system
MATSUMOTO KENJI1 citations52
TOKYO ELECTRON LTD
5 patentsUS8354337B2Jan 15, 2013
Metal oxide film formation method and apparatus
TOKYO ELECTRON LTD8 citations84
US8349725B2Jan 8, 2013
Method of manufacturing semiconductor device, semiconductor manufacturing apparatus, and storage medium
TOKYO ELECTRON LTD5 citations73
US8029856B2Oct 4, 2011
Film formation method and apparatus
TOKYO ELECTRON LTD4 citations61
US9252000B2Feb 2, 2016
Microwave waveguide apparatus, plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD1 citations50
US9852892B1Dec 26, 2017
Microwave supply apparatus, plasma processing apparatus, and plasma processing method
TOKYO ELECTRON LTD0 citations40
ITOH HITOSHI
5 patentsUS8610353B2Dec 17, 2013
Plasma generating apparatus, plasma processing apparatus and plasma processing method
ITOH HITOSHI7 citations82
US8587844B2Nov 19, 2013
Image inspecting apparatus, image inspecting method, and image forming apparatus
ITOH HITOSHI3 citations61
US8537421B2Sep 17, 2013
Image processing apparatus, method, and program product removing show-through from density image using mask image generated from gloss image
ITOH HITOSHI4 citations61
US10401287B2Sep 3, 2019
Lighting device, and apparatus and system incorporating the lighting device
ITOH HITOSHI0 citations51
US8268396B2Sep 18, 2012
Film forming method and apparatus, and storage medium
ITOH HITOSHI0 citations41
KOJIMA KEIJI
2 patentsUS8619278B2Dec 31, 2013
Printed matter examination apparatus, printed matter examination method, and printed matter examination system
KOJIMA KEIJI6 citations73
US8634108B2Jan 21, 2014
Method and apparatus for inspecting image, image forming apparatus, and computer-readable recording medium storing image inspecting program
KOJIMA KEIJI3 citations61