Inventor
NALAMASU OMKARAM
US46 patents
⚠️ This page may combine multiple inventors who share the name “NALAMASU OMKARAM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
10 patentsUS8932802B2Jan 13, 2015
Atomic layer deposition lithography
APPLIED MATERIALS INC337 citations99
US7971489B2Jul 5, 2011
Carbon nanotube-based load cells
APPLIED MATERIALS INC11 citations83
US9911582B2Mar 6, 2018
Methods and apparatus for controlling photoresist line width roughness with enhanced electron spin control
APPLIED MATERIALS INC2 citations73
US9280051B2Mar 8, 2016
Methods for reducing line width roughness and/or critical dimension nonuniformity in a patterned photoresist layer
APPLIED MATERIALS INC3 citations72
US9105921B2Aug 11, 2015
Porous amorphous silicon—carbon nanotube composite based electrodes for battery applications
APPLIED MATERIALS INC5 citations72
US11011676B2May 18, 2021
PVD buffer layers for LED fabrication
APPLIED MATERIALS INC0 citations61
US9350040B2May 24, 2016
Methods of and factories for thin-film battery manufacturing
APPLIED MATERIALS INC0 citations52
US9263078B2Feb 16, 2016
Patterning of magnetic thin film using energized ions
APPLIED MATERIALS INC0 citations52
US9177824B2Nov 3, 2015
Photoresist treatment method by low bombardment plasma
APPLIED MATERIALS INC0 citations52
US12094726B2Sep 17, 2024
Adapting electrical, mechanical, and thermal properties of package substrates
APPLIED MATERIALS INC0 citations49
LUCENT TECHNOLOGIES INC
9 patentsUS5843624ADec 1, 1998
Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
LUCENT TECHNOLOGIES INC310 citations98
US5750312AMay 12, 1998
Process for fabricating a device
LUCENT TECHNOLOGIES INC83 citations94
US5879857AMar 9, 1999
Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
LUCENT TECHNOLOGIES INC28 citations92
US6218057B1Apr 17, 2001
Lithographic process having sub-wavelength resolution
LUCENT TECHNOLOGIES INC20 citations91
US5998099ADec 7, 1999
Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
LUCENT TECHNOLOGIES INC38 citations91
US6159665ADec 12, 2000
Processes using photosensitive materials including a nitro benzyl ester photoacid generator
LUCENT TECHNOLOGIES INC22 citations90
US5830619ANov 3, 1998
Resist materials
LUCENT TECHNOLOGIES INC12 citations71
US5741629AApr 21, 1998
Resist materials and related processes
LUCENT TECHNOLOGIES INC10 citations71
US5958654ASep 28, 1999
Lithographic process and energy-sensitive material for use therein
LUCENT TECHNOLOGIES INC1 citations48
AGERE SYSTEMS INC
4 patentsUS6680150B2Jan 20, 2004
Suppression of side-lobe printing by shape engineering
AGERE SYSTEMS INC27 citations91
US6700708B2Mar 2, 2004
Micro-lens array and method of making micro-lens array
AGERE SYSTEMS INC8 citations71
US6537867B1Mar 25, 2003
High speed low voltage semiconductor devices and method of fabrication
AGERE SYSTEMS INC12 citations71
US6852648B2Feb 8, 2005
Semiconductor device having a low dielectric constant dielectric material and process for its manufacture
AGERE SYSTEMS INC3 citations63
PUSHPARAJ VICTOR L
4 patentsUS8334017B2Dec 18, 2012
Apparatus and methods for forming energy storage and photovoltaic devices in a linear system
PUSHPARAJ VICTOR L6 citations68
US8603195B2Dec 10, 2013
3D approach on battery and supercapitor fabrication by initiation chemical vapor deposition techniques
PUSHPARAJ VICTOR L4 citations60
US8526167B2Sep 3, 2013
Porous amorphous silicon-carbon nanotube composite based electrodes for battery applications
PUSHPARAJ VICTOR L2 citations60
US8136551B2Mar 20, 2012
Carbon nanotube-based gas valve
PUSHPARAJ VICTOR L0 citations50
AGERE SYST GUARDIAN CORP
3 patentsUS6392787B1May 21, 2002
Process for fabricating article comprising photonic band gap material
AGERE SYST GUARDIAN CORP49 citations91
US6296984B1Oct 2, 2001
Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
AGERE SYST GUARDIAN CORP16 citations84
US6251546B1Jun 26, 2001
Method of fabricating devices using an attenuated phase-shifting mask and an attenuated phase-shifting mask
AGERE SYST GUARDIAN CORP10 citations72