Inventor
VAN LEEST ADRIAAN JOHAN
NL30 patents
⚠️ This page may combine multiple inventors who share the name “VAN LEEST ADRIAAN JOHAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
18 patentsUS10615084B2Apr 7, 2020
Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values
ASML NETHERLANDS BV9 citations92
US10546790B2Jan 28, 2020
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV7 citations92
US10453758B2Oct 22, 2019
Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portion
ASML NETHERLANDS BV9 citations92
US12142535B2Nov 12, 2024
Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry
ASML NETHERLANDS BV2 citations84
US11784098B2Oct 10, 2023
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV3 citations84
US11145557B2Oct 12, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV5 citations84
US11101184B2Aug 24, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV2 citations84
US10811323B2Oct 20, 2020
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV4 citations82
US10481503B2Nov 19, 2019
Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
ASML NETHERLANDS BV2 citations73
US12322660B2Jun 3, 2025
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations62
US11728224B2Aug 15, 2023
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations62
US11101185B2Aug 24, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations62
US11092900B2Aug 17, 2021
Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
ASML NETHERLANDS BV0 citations62
US11710668B2Jul 25, 2023
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations61
US10369752B2Aug 6, 2019
Metrology method and apparatus, computer program and lithographic system
ASML NETHERLANDS BV1 citations61
US12210293B2Jan 28, 2025
Method for determining a measurement recipe and associated apparatuses
ASML NETHERLANDS BV0 citations52
US9760018B2Sep 12, 2017
Method and inspection apparatus and computer program product for assessing a quality of reconstruction of a value of a parameter of interest of a structure
ASML NETHERLANDS BV0 citations39
US10379446B2Aug 13, 2019
Lithography system, method and computer program product for hierarchical representation of two-dimensional or three-dimensional shapes
ASML NETHERLANDS BV0 citations34
VAN LEEST ADRIAAN JOHAN
4 patentsUS8948410B2Feb 3, 2015
Active audio noise cancelling
VAN LEEST ADRIAAN JOHAN22 citations91
US9241674B2Jan 26, 2016
Distortion reduced signal detection
VAN LEEST ADRIAAN JOHAN1 citations51
US9165549B2Oct 20, 2015
Audio noise cancelling
VAN LEEST ADRIAAN JOHAN1 citations51
US9124777B2Sep 1, 2015
Device and method for extracting information from characteristic signals
VAN LEEST ADRIAAN JOHAN1 citations51