Inventor
VERMA ALOK
NL28 patents
⚠️ This page may combine multiple inventors who share the name “VERMA ALOK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
21 patentsUS10615084B2Apr 7, 2020
Method and apparatus to determine a patterning process parameter, associated with a change in a physical configuration, using measured pixel optical characteristic values
ASML NETHERLANDS BV9 citations92
US10546790B2Jan 28, 2020
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV7 citations92
US10453758B2Oct 22, 2019
Method and apparatus to determine a patterning process parameter using an asymmetric optical characteristic distribution portion
ASML NETHERLANDS BV9 citations92
US12142535B2Nov 12, 2024
Method and apparatus to determine a patterning process parameter using a unit cell having geometric symmetry
ASML NETHERLANDS BV2 citations84
US11784098B2Oct 10, 2023
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV3 citations84
US11145557B2Oct 12, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV5 citations84
US11101184B2Aug 24, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV2 citations84
US10811323B2Oct 20, 2020
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV4 citations82
US10481503B2Nov 19, 2019
Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
ASML NETHERLANDS BV2 citations73
US9952517B2Apr 24, 2018
Method of determining dose, inspection apparatus, patterning device, substrate and device manufacturing method
ASML NETHERLANDS BV6 citations73
US10983445B2Apr 20, 2021
Method and apparatus for measuring a parameter of interest using image plane detection techniques
ASML NETHERLANDS BV3 citations71
US10747122B2Aug 18, 2020
Method of measuring a parameter of a device manufacturing process, metrology apparatus, substrate, target, device manufacturing system, and device manufacturing method
ASML NETHERLANDS BV2 citations71
US12322660B2Jun 3, 2025
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations62
US11728224B2Aug 15, 2023
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations62
US11101185B2Aug 24, 2021
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations62
US11092900B2Aug 17, 2021
Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method
ASML NETHERLANDS BV0 citations62
US10677589B2Jun 9, 2020
Substrate, metrology apparatus and associated methods for a lithographic process
ASML NETHERLANDS BV1 citations62
US11710668B2Jul 25, 2023
Method and apparatus to determine a patterning process parameter
ASML NETHERLANDS BV0 citations61
US10871367B2Dec 22, 2020
Substrate, metrology apparatus and associated methods for a lithographic process
ASML NETHERLANDS BV0 citations51
US11175592B2Nov 16, 2021
Methods and apparatus for inspection of a structure and associated apparatuses
ASML NETHERLANDS BV0 citations49
US10379446B2Aug 13, 2019
Lithography system, method and computer program product for hierarchical representation of two-dimensional or three-dimensional shapes
ASML NETHERLANDS BV0 citations34