Inventor
HAYASAKI KEI
JP33 patents
⚠️ This page may combine multiple inventors who share the name “HAYASAKI KEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
32 patentsUS6423977B1Jul 23, 2002
Pattern size evaluation apparatus
TOSHIBA KK37 citations93
US6881058B2Apr 19, 2005
Apparatus for processing substrate and method of processing the same
TOSHIBA KK14 citations92
US6742944B2Jun 1, 2004
Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
TOSHIBA KK13 citations92
US6441351B2Aug 27, 2002
Heating device, method for evaluating heating device and pattern forming method
TOSHIBA KK17 citations92
US6251544B1Jun 26, 2001
Exposure dose measuring method and exposure dose measuring mask
TOSHIBA KK25 citations92
US6191397B1Feb 20, 2001
Heating device, method for evaluating heating device and pattern forming method
TOSHIBA KK29 citations92
US7364839B2Apr 29, 2008
Method for forming a pattern and substrate-processing apparatus
TOSHIBA KK10 citations84
US7327436B2Feb 5, 2008
Method for evaluating a local flare, correction method for a mask pattern, manufacturing method for a semiconductor device and a computer program product
TOSHIBA KK12 citations84
US7018481B2Mar 28, 2006
Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle
TOSHIBA KK13 citations83
US7510341B2Mar 31, 2009
Temperature calibration method for baking processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatus
TOSHIBA KK14 citations82
US6800569B2Oct 5, 2004
Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus
TOSHIBA KK12 citations82
US6831258B2Dec 14, 2004
Heating device, method for evaluating heating device and pattern forming method
TOSHIBA KK4 citations74
US6686130B2Feb 3, 2004
Pattern forming method using photolithography
TOSHIBA KK11 citations74
US6603101B2Aug 5, 2003
Heating device, method for evaluating heating device and pattern forming method
TOSHIBA KK11 citations74
US6187488B1Feb 13, 2001
Pattern estimating method and pattern forming method
TOSHIBA KK13 citations74
US7604832B2Oct 20, 2009
Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus
TOSHIBA KK7 citations73
US7483155B2Jan 27, 2009
Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus
TOSHIBA KK6 citations73
US7312018B2Dec 25, 2007
Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus
TOSHIBA KK6 citations73
US7662546B2Feb 16, 2010
Apparatus for processing substrate and method of processing the same
TOSHIBA KK2 citations63
US7563561B2Jul 21, 2009
Pattern forming method and a semiconductor device manufacturing method
TOSHIBA KK2 citations63
US7368209B2May 6, 2008
Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method of semiconductor device
TOSHIBA KK3 citations63
US7005249B2Feb 28, 2006
Apparatus for processing substrate and method of processing the same
TOSHIBA KK2 citations63
US7669608B2Mar 2, 2010
Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle
TOSHIBA KK4 citations62
US7399578B2Jul 15, 2008
Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
TOSHIBA KK3 citations62
US7097960B2Aug 29, 2006
Alkaline solution and manufacturing method, and alkaline solution applied to pattern forming method, resist film removing method, solution application method, substrate treatment method, solution supply method, and semiconductor device manufacturing method
TOSHIBA KK1 citations62
US6818387B2Nov 16, 2004
Method of forming a pattern
TOSHIBA KK2 citations62
US7972765B2Jul 5, 2011
Pattern forming method and a semiconductor device manufacturing method
TOSHIBA KK1 citations52
US7903264B2Mar 8, 2011
Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus
TOSHIBA KK0 citations52
US7794923B2Sep 14, 2010
Substrate processing method, substrate processing apparatus, and manufacturing method of semiconductor device
TOSHIBA KK1 citations52
US7005238B2Feb 28, 2006
Apparatus for processing substrate and method of processing the same
TOSHIBA KK0 citations52
US7683291B2Mar 23, 2010
Substrate processing method and manufacturing method of semiconductor device
TOSHIBA KK0 citations51
US7968272B2Jun 28, 2011
Semiconductor device manufacturing method to form resist pattern
TOSHIBA KK0 citations42