Inventor
Shaikh Fayaz
US11 patents
Patents
11 patentsUS10851457B2Dec 1, 2020
PECVD deposition system for deposition on selective side of the substrate
LAM RES CORP14 citations91
US11725283B2Aug 15, 2023
PECVD deposition system for deposition on selective side of the substrate
LAM RES CORP5 citations83
US11441222B2Sep 13, 2022
PECVD deposition system for deposition on selective side of the substrate
LAM RES CORP7 citations83
US10388485B2Aug 20, 2019
Inter-electrode gap variation methods for compensating deposition non-uniformity
LAM RES CORP3 citations71
US10096475B1Oct 9, 2018
System and method for depositing a homogenous interface for PECVD metal-doped carbon hardmasks
LAM RES CORP6 citations71
US9928994B2Mar 27, 2018
Methods for decreasing carbon-hydrogen content of amorphous carbon hardmask films
LAM RES CORP3 citations71
US9859088B2Jan 2, 2018
Inter-electrode gap variation methods for compensating deposition non-uniformity
LAM RES CORP5 citations71
US11851760B2Dec 26, 2023
PECVD deposition system for deposition on selective side of the substrate
LAM RES CORP1 citations70
US11674226B2Jun 13, 2023
Separation of plasma suppression and wafer edge to improve edge film thickness uniformity
LAM RES CORP2 citations70
US9520295B2Dec 13, 2016
Metal doping of amorphous carbon and silicon films used as hardmasks in substrate processing systems
LAM RES CORP6 citations70
US9875890B2Jan 23, 2018
Deposition of metal dielectric film for hardmasks
LAM RES CORP0 citations51