Inventor

SHIM SEUNGBO

KR42 patents

⚠️ This page may combine multiple inventors who share the name “SHIM SEUNGBO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHIM SEUNGBO

SAMSUNG ELECTRONICS CO LTD

Plasma etching method and semiconductor device fabrication method including the same

Electrostatic chuck and plasma processing apparatus including the same

Method of plasma etching and method of fabricating semiconductor device using the same

Method of plasma etching and method of fabricating semiconductor device using the same

Method of plasma etching and method of fabricating semiconductor device using the same

Electronic device including in interposer

Plasma control apparatus and plasma processing system including the same

Electronic device comprising interposer

Electronic device including flexible display and method for operating electronic device

Impedance measurement jig and method of controlling a substrate-processing apparatus using the jig

Electrostatic chuck and plasma processing apparatus including the same

Method for controlling flexible display and electronic device supporting the same

Plasma etching method and semiconductor device fabrication method including the same

High voltage power supply apparatus and plasma etching equipment having the same

Upper electrode and substrate processing apparatus including the same

Upper electrode and substrate processing apparatus including the same

Plasma processing apparatus

Electronic device using interposer in printed circuit board

Circuit board module and electronic device including the same

Electronic device and method for capturing image by using angle of view of camera module

Electronic device including stacked printed circuit boards

Electronic device having connection path between buck converters

Device for radical diagnostic in plasma processing chamber, radical diagnostic system having the same, and operating method thereof

Electronic device comprising flexible display

Substrate treatment apparatus and semiconductor device manufacturing method using the same

Plasma etching apparatus, plasma etching method, and semiconductor device fabrication method including the plasma etching method

Apparatus for providing RF power and operating method thereof

Method of measuring parameters of plasma, apparatus for measuring parameters of plasma, plasma processing system, and method of processing wafer

Apparatus and method fabricating semiconductor device

Plasma processing apparatus and method of manufacturing semiconductor device by using same

RF generating device and semiconductor manufacturing apparatus including the same

Hybrid matcher and radio frequency matching system including the hybrid matcher

SAMSUNG DISPLAY CO LTD

Display device and method of manufacturing the same

Etchant composition, and method for manufacturing metal pattern and array substrate using the same

Etchant composition and methods for manufacturing metal pattern and array substrate using the same

Display device including coupled display panels

Display device

Display panel and method of manufacturing the same

Coupling display device and tiled display device having the same

Etchant composition, and method for manufacturing metal pattern and thin film transistor substrate using the same

Display substrate including a multi-layer structure of an organic layer and an inorganic layer, display device having the same, and method of manufacturing the display substrate

LIQUAVISTA BV

Electrowetting display device