Inventor
BRUCE JAMES A
US28 patents
⚠️ This page may combine multiple inventors who share the name “BRUCE JAMES A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
22 patentsUS6147394ANov 14, 2000
Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby
IBM54 citations95
US7257247B2Aug 14, 2007
Mask defect analysis system
IBM13 citations92
US6539321B2Mar 25, 2003
Method for edge bias correction of topography-induced linewidth variation
IBM22 citations92
US6395438B1May 28, 2002
Method of etch bias proximity correction
IBM33 citations92
US5972570AOct 26, 1999
Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby
IBM38 citations92
US5552718ASep 3, 1996
Electrical test structure and method for space and line measurement
IBM29 citations92
US4978594ADec 18, 1990
Fluorine-containing base layer for multi-layer resist processes
IBM39 citations90
US5614990AMar 25, 1997
Illumination tailoring system using photochromic filter
IBM34 citations89
US6577406B2Jun 10, 2003
Structure for lithographic focus control features
IBM16 citations83
US5760483AJun 2, 1998
Method for improving visibility of alignment targets in semiconductor processing
IBM16 citations82
US7269808B2Sep 11, 2007
Design verification
IBM11 citations80
US6395624B1May 28, 2002
Method for forming implants in semiconductor fabrication
IBM11 citations74
US6300228B1Oct 9, 2001
Multiple precipitation doping process
IBM9 citations74
US6015750AJan 18, 2000
Method for improving visibility of alignment target in semiconductor processing
IBM5 citations74
US4612805ASep 23, 1986
Adhesion characterization test site
IBM11 citations66
US6338921B1Jan 15, 2002
Mask with linewidth compensation and method of making same
IBM6 citations63
US6303416B1Oct 16, 2001
Method to reduce plasma etch fluting
IBM8 citations63
US7492941B2Feb 17, 2009
Mask defect analysis system
IBM3 citations62
US7492940B2Feb 17, 2009
Mask defect analysis system
IBM2 citations62
US6766507B2Jul 20, 2004
Mask/wafer control structure and algorithm for placement
IBM5 citations61
US7562337B2Jul 14, 2009
OPC verification using auto-windowed regions
IBM3 citations57
US6369397B1Apr 9, 2002
SPM base focal plane positioning
IBM1 citations52
BRUCE JAMES A
4 patentsUS8619236B2Dec 31, 2013
Determining lithographic set point using optical proximity correction verification simulation
BRUCE JAMES A1 citations50
US8499260B2Jul 30, 2013
Optical proximity correction verification accounting for mask deviations
BRUCE JAMES A0 citations50
US8219964B2Jul 10, 2012
Method for creating electrically testable patterns
BRUCE JAMES A1 citations50
US8577489B2Nov 5, 2013
Diagnosing in-line critical dimension control adjustments using optical proximity correction verification
BRUCE JAMES A0 citations39