P

Inventor

YOKOI NAOKI

JP19 patents
⚠️ This page may combine multiple inventors who share the name “YOKOI NAOKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MITSUBISHI ELECTRIC CORP

7 patents
US6482750B2Nov 19, 2002

Method of manufacturing semiconductor device including a cleaning step, and semiconductor device manufactured thereby

MITSUBISHI ELECTRIC CORP19 citations92
US6032382AMar 7, 2000

Drying apparatus and method using IPA of a semiconductor wafer

MITSUBISHI ELECTRIC CORP33 citations92
US6432815B2Aug 13, 2002

Method of cleaning a silicon substrate after blanket depositing a tungsten film by dipping in a solution having hydrofluoric acid, hydrochloric acid, and/or ammonium hydroxide prior to patterning the tungsten film

MITSUBISHI ELECTRIC CORP6 citations73
US6586145B2Jul 1, 2003

Method of fabricating semiconductor device and semiconductor device

MITSUBISHI ELECTRIC CORP8 citations72
US6391113B1May 21, 2002

Semiconductor wafer processing apparatus and method of controlling the same

MITSUBISHI ELECTRIC CORP7 citations72
US6596630B2Jul 22, 2003

Method of cleaning a silicon substrate after blanket depositing a tungsten film by dipping in a solution of hydrofluoric acid, hydrochloric acid, and/or ammonium hydroxide

MITSUBISHI ELECTRIC CORP4 citations62
US6531381B2Mar 11, 2003

Method and apparatus for cleaning semiconductor device and method of fabricating semiconductor device

MITSUBISHI ELECTRIC CORP0 citations51

ELPIDA MEMORY INC

3 patents
US7919803B2Apr 5, 2011

Semiconductor memory device having a capacitor structure with a desired capacitance and manufacturing method therefor

ELPIDA MEMORY INC6 citations62
US7332395B2Feb 19, 2008

Method of manufacturing a capacitor

ELPIDA MEMORY INC6 citations62
US7494864B2Feb 24, 2009

Method for production of semiconductor device

ELPIDA MEMORY INC0 citations41

RYODEN SEMICONDUCTOR SYST ENG

2 patents
US5956859ASep 28, 1999

Drying apparatus for processing surface of substrate

RYODEN SEMICONDUCTOR SYST ENG45 citations92
US5996242ADec 7, 1999

Drying apparatus and method

RYODEN SEMICONDUCTOR SYST ENG8 citations73

RENESAS TECH CORP

2 patents
US6837963B2Jan 4, 2005

Semiconductor device, method of producing a semiconductor device, and semiconductor substrate cleaning apparatus used for the production method

RENESAS TECH CORP19 citations91
US6730239B1May 4, 2004

Cleaning agent for semiconductor device & method of fabricating semiconductor device

RENESAS TECH CORP7 citations71

FUJI XEROX CO LTD

2 patents
US4603970AAug 5, 1986

Apparatus for inhibiting copying of confidential documents

FUJI XEROX CO LTD33 citations89
US4544936AOct 1, 1985

Heat-sensitive recording sheet

FUJI XEROX CO LTD23 citations81

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

1 patent
US6642142B2Nov 4, 2003

Substrate cleaning method and method for producing an electronic device

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD11 citations72

YOKOI NAOKI

1 patent
US8258630B2Sep 4, 2012

Semiconductor device and method of manufacturing the same

YOKOI NAOKI6 citations67

MICRON TECHNOLOGY INC

1 patent
US12051631B2Jul 30, 2024

Stacked semiconductor device with removable probe pads

MICRON TECHNOLOGY INC0 citations51