Inventor
HAYANO FUMINORI
JP22 patents
⚠️ This page may combine multiple inventors who share the name “HAYANO FUMINORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
20 patentsUS5663569ASep 2, 1997
Defect inspection method and apparatus, and defect display method
NIKON CORP84 citations96
US4999510AMar 12, 1991
Apparatus for detecting foreign particles on a surface of a reticle or pellicle
NIKON CORP70 citations96
US4966457AOct 30, 1990
Inspecting apparatus for determining presence and location of foreign particles on reticles or pellicles
NIKON CORP122 citations96
US4889998ADec 26, 1989
Apparatus with four light detectors for checking surface of mask with pellicle
NIKON CORP117 citations96
US5072128ADec 10, 1991
Defect inspecting apparatus using multiple color light to detect defects
NIKON CORP101 citations95
US5436464AJul 25, 1995
Foreign particle inspecting method and apparatus with correction for pellicle transmittance
NIKON CORP73 citations93
US5719405AFeb 17, 1998
Particle inspecting apparatus and method using fourier transform
NIKON CORP23 citations92
US5623340AApr 22, 1997
Foreign particle inspection apparatus
NIKON CORP22 citations92
US5473426ADec 5, 1995
Defect inspection apparatus
NIKON CORP50 citations92
US5363187ANov 8, 1994
Light scanning apparatus for detecting foreign particles on surface having circuit pattern
NIKON CORP45 citations92
US4803373AFeb 7, 1989
Conveyor arm apparatus with gap detection
NIKON CORP53 citations92
US7218399B2May 15, 2007
Method and apparatus for measuring optical overlay deviation
NIKON CORP6 citations74
US5149982ASep 22, 1992
Foreign particle inspection apparatus
NIKON CORP13 citations74
US10760902B2Sep 1, 2020
Measurement processing device, x-ray inspection apparatus, method for manufacturing structure, measurement processing method, x-ray inspection method, measurement processing program, and x-ray inspection program
NIKON CORP2 citations70
US10557706B2Feb 11, 2020
Measurement processing device, x-ray inspection apparatus, method for manufacturing structure, measurement processing method, x-ray inspection method, measurement processing program, and x-ray inspection program
NIKON CORP3 citations70
US11016039B2May 25, 2021
Measurement processing device, measurement processing method, measurement processing program, and method for manufacturing structure
NIKON CORP0 citations59
US11016038B2May 25, 2021
Measurement processing device, measurement processing method, measurement processing program, and method for manufacturing structure
NIKON CORP1 citations59
US7362436B2Apr 22, 2008
Method and apparatus for measuring optical overlay deviation
NIKON CORP1 citations52
US10809209B2Oct 20, 2020
Measurement processing device, x-ray inspection device, measurement processing method, measurement processing program, and structure manufacturing method
NIKON CORP0 citations48
US10481106B2Nov 19, 2019
Measurement processing device, X-ray inspection device, measurement processing method, measurement processing program, and structure manufacturing method
NIKON CORP0 citations48