Inventor
CARCASI MICHAEL A
US22 patents
⚠️ This page may combine multiple inventors who share the name “CARCASI MICHAEL A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
17 patentsUS9613801B2Apr 4, 2017
Integration of absorption based heating bake methods into a photolithography track system
TOKYO ELECTRON LTD464 citations98
US9746774B2Aug 29, 2017
Mitigation of EUV shot noise replicating into acid shot noise in photo-sensitized chemically-amplified resist (PS-CAR)
TOKYO ELECTRON LTD10 citations84
US8980538B2Mar 17, 2015
Chemi-epitaxy in directed self-assembly applications using photo-decomposable agents
TOKYO ELECTRON LTD8 citations84
US8024676B2Sep 20, 2011
Multi-pitch scatterometry targets
TOKYO ELECTRON LTD15 citations84
US10020195B2Jul 10, 2018
Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists
TOKYO ELECTRON LTD8 citations83
US9618848B2Apr 11, 2017
Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes
TOKYO ELECTRON LTD12 citations83
US9519227B2Dec 13, 2016
Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR)
TOKYO ELECTRON LTD12 citations83
US10551743B2Feb 4, 2020
Critical dimension control by use of photo-sensitized chemicals or photo-sensitized chemically amplified resist
TOKYO ELECTRON LTD4 citations73
US10522428B2Dec 31, 2019
Critical dimension control by use of a photo agent
TOKYO ELECTRON LTD4 citations73
US10096528B2Oct 9, 2018
Critical dimension control by use of a photo agent
TOKYO ELECTRON LTD4 citations73
US9786523B2Oct 10, 2017
Method and apparatus for substrate rinsing and drying
TOKYO ELECTRON LTD2 citations73
US9085045B2Jul 21, 2015
Method and system for controlling a spike anneal process
TOKYO ELECTRON LTD4 citations72
US12165870B2Dec 10, 2024
Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resists
TOKYO ELECTRON LTD0 citations62
US7435692B2Oct 14, 2008
Gas jet reduction of iso-dense field thickness bias for gapfill process
TOKYO ELECTRON LTD5 citations62
US7671412B2Mar 2, 2010
Method and device for controlling temperature of a substrate using an internal temperature control device
TOKYO ELECTRON LTD4 citations54
US11061332B2Jul 13, 2021
Methods for sensitizing photoresist using flood exposures
TOKYO ELECTRON LTD0 citations52
US10534266B2Jan 14, 2020
Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes
TOKYO ELECTRON LTD0 citations51
CARCASI MICHAEL A
4 patentsUS8435728B2May 7, 2013
Method of slimming radiation-sensitive material lines in lithographic applications
CARCASI MICHAEL A2 citations58
US8338086B2Dec 25, 2012
Method of slimming radiation-sensitive material lines in lithographic applications
CARCASI MICHAEL A3 citations58
US8474468B2Jul 2, 2013
Apparatus and method for thermally processing a substrate with a heated liquid
CARCASI MICHAEL A0 citations39
US8178820B2May 15, 2012
Method and heat treatment apparatus for uniformly heating a substrate during a bake process
CARCASI MICHAEL A0 citations39