Inventor

WIELAND MARCO JAN-JACO

NL79 patents

⚠️ This page may combine multiple inventors who share the name “WIELAND MARCO JAN-JACO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WIELAND MARCO JAN-JACO

MAPPER LITHOGRAPHY IP BV

Charged particle beamlet exposure system

Lithography system

Electron beam exposure system

Electron beam exposure system

Method for exposing a wafer

Lithography system and projection method

Lithography system, sensor and measuring method

Lithography system and projection method

Modulator circuitry

Proximity effect correction in a charged particle lithography system

Method of and system for exposing a target

Fabricating unique chips using a charged particle multi-beamlet lithography system

Multi-electrode cooling arrangement

Projection lens arrangement

Lithography system

Method and arrangement for handling and processing substrates

Charged particle lithography system with intermediate chamber

ASML NETHERLANDS BV

Fabricating unique chips using a charged particle multi-beamlet lithography system

Charged particle assessment tool, inspection method

Charged particle optical device, objective lens assembly, detector, detector array, and methods

Lithography system, sensor and measuring method

Fabricating unique chips using a charged particle multi-beamlet lithography system

Charged particle assessment tool, inspection method

Charged particle assessment tool, inspection method

Charged particle optical device, objective lens assembly, detector, detector array, and methods

Aberration correction in charged particle system

Vacuum chamber arrangement for charged particle beam generator

Method and arrangement for handling and processing substrates

Vacuum chamber arrangement for charged particle beam generator

Memory device with predetermined start-up value

Aberration correction in charged particle system

Fabricating unique chips using a charged particle multi-beamlet lithography system

WIELAND MARCO JAN-JACO

Method of and system for exposing a target

Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams

Projection lens arrangement

Imaging system

Projection lens arrangement

Charged particle lithography system with aperture array cooling

Charged particle multi-beamlet lithography system with modulation device

Charged particle multi-beamlet lithography system, modulation device, and method of manufacturing thereof

Charged particle beam modulator

Modulation device and charged particle multi-beamlet lithography system using the same

VAN DE PEUT TEUNIS

Method of generating a two-level pattern for lithographic processing and pattern generator using the same

Dual pass scanning

WIELAND MARCO JAN JACO

Projection lens arrangement

Beamlet blanker arrangement

DE JONG HENDRIK JAN

Method of clamping a substrate and clamp preparation unit using capillary clamping force

DINU-GUERTLER LAURA

Charged particle lithography system with intermediate chamber

MAPPER LIGHOGRAPHY IP B V

Optical switching in lithography system

DERKS HENK

Data path for lithography apparatus