Inventor
FAGGINGER AUER BASTIAAN ONNE
NL11 patents
Patents
11 patentsUS10488768B2Nov 26, 2019
Beat patterns for alignment on small metrology targets
ASML NETHERLANDS BV10 citations82
US10162271B2Dec 25, 2018
Metrology method and apparatus, substrate, lithographic system and device manufacturing method
ASML NETHERLANDS BV7 citations82
US10599047B2Mar 24, 2020
Metrology apparatus, lithographic system, and method of measuring a structure
ASML NETHERLANDS BV2 citations72
US10983445B2Apr 20, 2021
Method and apparatus for measuring a parameter of interest using image plane detection techniques
ASML NETHERLANDS BV3 citations71
US10739687B2Aug 11, 2020
Metrology method and apparatus, substrate, lithographic system and device manufacturing method
ASML NETHERLANDS BV4 citations71
US10317805B2Jun 11, 2019
Method for monitoring a characteristic of illumination from a metrology apparatus
ASML NETHERLANDS BV2 citations68
US11526085B2Dec 13, 2022
Metrology method and apparatus, substrate, lithographic system and device manufacturing method
ASML NETHERLANDS BV0 citations61
US11556060B2Jan 17, 2023
Method of calibrating a plurality of metrology apparatuses, method of determining a parameter of interest, and metrology apparatus
ASML NETHERLANDS BV0 citations48
US10571363B2Feb 25, 2020
Method of determining an optimal focus height for a metrology apparatus
ASML NETHERLANDS BV0 citations47
US10394135B2Aug 27, 2019
Method and apparatus for measuring a parameter of a lithographic process, computer program products for implementing such methods and apparatus
ASML NETHERLANDS BV0 citations41
US10585354B2Mar 10, 2020
Method of optimizing a metrology process
ASML NETHERLANDS BV0 citations35