Inventor
CHANG HSIAO-LUN
TW13 patents
Patents
13 patentsUS11528798B2Dec 13, 2022
Replacement method for droplet generator
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US11470710B2Oct 11, 2022
EUV light source and apparatus for EUV lithography
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US10880980B2Dec 29, 2020
EUV light source and apparatus for EUV lithography
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US12028959B2Jul 2, 2024
EUV light source and apparatus for EUV lithography
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11997778B2May 28, 2024
Replacement and refill method for droplet generator
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11982944B2May 14, 2024
Method of lithography process and transferring a reticle
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11703763B2Jul 18, 2023
Method of lithography process using reticle container with discharging device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11599030B2Mar 7, 2023
Droplet catcher, droplet catcher system of EUV lithography apparatus, and maintenance method of the EUV lithography apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11320733B2May 3, 2022
Reticle with conductive material structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11134558B2Sep 28, 2021
Droplet generator assembly and method for using the same and radiation source apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11067906B2Jul 20, 2021
Droplet catcher system of EUV lithography apparatus and EUV lithography apparatus maintenance method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11032897B2Jun 8, 2021
Refill and replacement method for droplet generator
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10802394B2Oct 13, 2020
Method for discharging static charges on reticle
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51