Inventor
HIRAYAMA MASAKI
JP85 patents
⚠️ This page may combine multiple inventors who share the name “HIRAYAMA MASAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
16 patentsUS6830652B1Dec 14, 2004
Microwave plasma processing apparatus
TOKYO ELECTRON LTD84 citations98
US7115184B2Oct 3, 2006
Plasma processing device
TOKYO ELECTRON LTD28 citations93
US7819082B2Oct 26, 2010
Plasma processing apparatus
TOKYO ELECTRON LTD8 citations84
US7374620B2May 20, 2008
Substrate processing apparatus
TOKYO ELECTRON LTD12 citations84
US7141756B2Nov 28, 2006
Microwave plasma processing apparatus, plasma ignition method, plasma forming method, and plasma processing method
TOKYO ELECTRON LTD11 citations84
US7097735B2Aug 29, 2006
Plasma processing device
TOKYO ELECTRON LTD16 citations84
US7083701B2Aug 1, 2006
Device and method for plasma processing, and slow-wave plate
TOKYO ELECTRON LTD16 citations84
US12087552B2Sep 10, 2024
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD4 citations75
US11923170B2Mar 5, 2024
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD6 citations75
US11854772B2Dec 26, 2023
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD4 citations75
US6896490B2May 24, 2005
Vacuum apparatus
TOKYO ELECTRON LTD8 citations74
US6675737B2Jan 13, 2004
Plasma processing apparatus
TOKYO ELECTRON LTD10 citations74
US8733281B2May 27, 2014
Plasma processing apparatus
TOKYO ELECTRON LTD5 citations73
US7432468B2Oct 7, 2008
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD8 citations73
US12051564B2Jul 30, 2024
Shower plate, plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD0 citations63
US11443927B2Sep 13, 2022
Plasma treatment device
TOKYO ELECTRON LTD1 citations63
OHMI TADAHIRO
13 patentsUS6446573B2Sep 10, 2002
Plasma process device
OHMI TADAHIRO572 citations99
US6585851B1Jul 1, 2003
Plasma etching device
OHMI TADAHIRO178 citations98
US8114245B2Feb 14, 2012
Plasma etching device
OHMI TADAHIRO157 citations97
US6357385B1Mar 19, 2002
Plasma device
OHMI TADAHIRO124 citations97
US5714795AFeb 3, 1998
Semiconductor device utilizing silicide reaction
OHMI TADAHIRO89 citations96
US7520245B2Apr 21, 2009
Plasma processing apparatus
OHMI TADAHIRO17 citations93
US6975018B2Dec 13, 2005
Semiconductor device
OHMI TADAHIRO49 citations93
US6818852B2Nov 16, 2004
Microwave plasma processing device, plasma processing method, and microwave radiating member
OHMI TADAHIRO39 citations93
US6736606B1May 18, 2004
Vacuum apparatus
OHMI TADAHIRO16 citations93
US6719875B1Apr 13, 2004
Plasma process apparatus
OHMI TADAHIRO22 citations92
US6153068ANov 28, 2000
Parallel plate sputtering device with RF powered auxiliary electrodes and applied external magnetic field
OHMI TADAHIRO34 citations92
US5650650AJul 22, 1997
High speed semiconductor device with a metallic substrate
OHMI TADAHIRO18 citations84
US5703488ADec 30, 1997
Instrument for measuring plasma excited by high-frequency
OHMI TADAHIRO15 citations74
CANON KK
7 patentsUS6690702B1Feb 10, 2004
Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube
CANON KK23 citations93
US6331994B1Dec 18, 2001
Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube
CANON KK20 citations93
US6929830B2Aug 16, 2005
Plasma treatment method and method of manufacturing optical parts using the same
CANON KK50 citations90
US6829279B1Dec 7, 2004
Laser oscillating apparatus, exposure apparatus using the same and device fabrication method
CANON KK13 citations84
US6804285B2Oct 12, 2004
Gas supply path structure for a gas laser
CANON KK6 citations74
US6744802B1Jun 1, 2004
Laser oscillating apparatus with slotted waveguide
CANON KK8 citations74
US6603786B1Aug 5, 2003
Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube
CANON KK5 citations74
SHARP KK
5 patentsUS6620290B2Sep 16, 2003
Plasma process apparatus
SHARP KK30 citations93
US6527908B2Mar 4, 2003
Plasma process apparatus
SHARP KK40 citations91
US6726802B2Apr 27, 2004
Plasma processing apparatus
SHARP KK14 citations84
US6638392B2Oct 28, 2003
Plasma process apparatus
SHARP KK18 citations84
US6783628B2Aug 31, 2004
Plasma processing apparatus
SHARP KK8 citations74
FOUND ADVANCEMENT INT SCIENCE
3 patentsUS7439121B2Oct 21, 2008
Dielectric film and method of forming it, semiconductor device, non-volatile semiconductor memory device, and production method for semiconductor device
FOUND ADVANCEMENT INT SCIENCE21 citations92
US7312415B2Dec 25, 2007
Plasma method with high input power
FOUND ADVANCEMENT INT SCIENCE40 citations91
US7718484B2May 18, 2010
Method of forming a dielectic film that contains silicon, oxygen and nitrogen and method of fabricating a semiconductor device that uses such a dielectric film
FOUND ADVANCEMENT INT SCIENCE5 citations74
ORGANO CORP
2 patentsTADAHIRO OHMI
2 patentsUNIV TOHOKU
1 patentGOTO NAOHISA
1 patentShowing the top 50 of 85 patents by PatentIndex Score.