Inventor
MATSUOKA TAKAAKI
JP32 patents
⚠️ This page may combine multiple inventors who share the name “MATSUOKA TAKAAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
9 patentsUS8716114B2May 6, 2014
Semiconductor device manufacturing method and semiconductor device
TOKYO ELECTRON LTD40 citations94
US6285102B1Sep 4, 2001
Drive mechanism having a gas bearing operable under a negative pressure environment
TOKYO ELECTRON LTD48 citations92
US7874781B2Jan 25, 2011
Substrate processing apparatus
TOKYO ELECTRON LTD17 citations84
US7803705B2Sep 28, 2010
Manufacturing method of semiconductor device and film deposition system
TOKYO ELECTRON LTD8 citations84
US7780391B2Aug 24, 2010
Substrate processing device
TOKYO ELECTRON LTD3 citations62
US7313931B2Jan 1, 2008
Method and device for heat treatment
TOKYO ELECTRON LTD5 citations62
US6951815B2Oct 4, 2005
Method and device for heat treatment
TOKYO ELECTRON LTD4 citations62
US9767994B2Sep 19, 2017
Shower plate sintered integrally with gas release hole member and method for manufacturing the same
TOKYO ELECTRON LTD0 citations51
US8021975B2Sep 20, 2011
Plasma processing method for forming a film and an electronic component manufactured by the method
TOKYO ELECTRON LTD0 citations51
OHMI TADAHIRO
6 patentsUS8399862B2Mar 19, 2013
Ion implanting apparatus and ion implanting method
OHMI TADAHIRO20 citations92
US8535494B2Sep 17, 2013
Rotary magnet sputtering apparatus
OHMI TADAHIRO5 citations73
US8573151B2Nov 5, 2013
Microwave plasma processing apparatus, dielectric window for use in the microwave plasma processing apparatus, and method for manufacturing the dielectric window
OHMI TADAHIRO3 citations61
US9812302B2Nov 7, 2017
Magnetron sputtering apparatus
OHMI TADAHIRO0 citations42
US8568577B2Oct 29, 2013
Magnetron sputtering apparatus
OHMI TADAHIRO0 citations42
US8496792B2Jul 30, 2013
Rotary magnet sputtering apparatus
OHMI TADAHIRO0 citations42
MATSUOKA TAKAAKI
5 patentsUS8278205B2Oct 2, 2012
Semiconductor device and method for manufacturing the same
MATSUOKA TAKAAKI4 citations61
US8197913B2Jun 12, 2012
Film forming method for a semiconductor
MATSUOKA TAKAAKI2 citations61
US9117764B2Aug 25, 2015
Etching method, substrate processing method, pattern forming method, method for manufacturing semiconductor element, and semiconductor element
MATSUOKA TAKAAKI2 citations58
US8435882B2May 7, 2013
Film forming method for a semiconductor
MATSUOKA TAKAAKI1 citations51
US8334204B2Dec 18, 2012
Semiconductor device and manufacturing method therefor
MATSUOKA TAKAAKI0 citations39