Inventor
PURI SURAJ
US30 patents
⚠️ This page may combine multiple inventors who share the name “PURI SURAJ”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
YIELDUP INTERNATIONAL
14 patentsUS5571337ANov 5, 1996
Method for cleaning and drying a semiconductor wafer
YIELDUP INTERNATIONAL137 citations98
US5932027AAug 3, 1999
Cleaning and drying photoresist coated wafers
YIELDUP INTERNATIONAL31 citations96
US5873947AFeb 23, 1999
Ultra-low particle disk cleaner
YIELDUP INTERNATIONAL27 citations96
US5772784AJun 30, 1998
Ultra-low particle semiconductor cleaner
YIELDUP INTERNATIONAL53 citations96
US5634978AJun 3, 1997
Ultra-low particle semiconductor method
YIELDUP INTERNATIONAL56 citations96
US5542441AAug 6, 1996
Apparatus for delivering ultra-low particle counts in semiconductor manufacturing
YIELDUP INTERNATIONAL49 citations95
US5988189ANov 23, 1999
Method and apparatus for cleaning wafers using multiple tanks
YIELDUP INTERNATIONAL20 citations92
US5958146ASep 28, 1999
Ultra-low particle semiconductor cleaner using heated fluids
YIELDUP INTERNATIONAL41 citations92
US5891256AApr 6, 1999
Ultra-low particle semiconductor cleaner
YIELDUP INTERNATIONAL18 citations92
US5878760AMar 9, 1999
Ultra-low particle semiconductor cleaner
YIELDUP INTERNATIONAL22 citations92
US5868150AFeb 9, 1999
Ultra-low particle semiconductor cleaner
YIELDUP INTERNATIONAL17 citations92
US5849104ADec 15, 1998
Method and apparatus for cleaning wafers using multiple tanks
YIELDUP INTERNATIONAL42 citations92
US5685327ANov 11, 1997
Ultra-low particle semiconductor apparatus
YIELDUP INTERNATIONAL32 citations92
US5651379AJul 29, 1997
Method and apparatus for delivering ultra-low particle counts in semiconductor manufacturing
YIELDUP INTERNATIONAL27 citations91
NANO OM LLC
5 patentsUS8375965B2Feb 19, 2013
Systems and methods for single integrated substrate cleaning and rinsing
NANO OM LLC4 citations62
US7914624B2Mar 29, 2011
Systems and methods for charging a cleaning solution used for cleaning integrated circuit substrates
NANO OM LLC1 citations62
US7731800B2Jun 8, 2010
Systems and methods for single integrated substrate cleaning and rinsing
NANO OM LLC4 citations62
US8377217B2Feb 19, 2013
Systems and methods for charging a cleaning solution used for cleaning integrated circuit substrates
NANO OM LLC0 citations51
US7655094B2Feb 2, 2010
Systems and methods for charging a cleaning solution used for cleaning integrated circuit substrates
NANO OM LLC0 citations51
SCD MOUNTAIN VIEW INC
3 patentsUS6491043B2Dec 10, 2002
Ultra-low particle semiconductor cleaner
SCD MOUNTAIN VIEW INC38 citations95
US6312597B1Nov 6, 2001
Apparatus for delivering ultra-low particle counts in semiconductor manufacturing
SCD MOUNTAIN VIEW INC16 citations91
US6045621AApr 4, 2000
Method for cleaning objects using a fluid charge
SCD MOUNTAIN VIEW INC15 citations73