Inventor
OH CHANG-IL
KR24 patents
⚠️ This page may combine multiple inventors who share the name “OH CHANG-IL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CHEIL IND INC
11 patentsUS7981594B2Jul 19, 2011
Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same
CHEIL IND INC19 citations92
US7378217B2May 27, 2008
Antireflective hardmask composition and methods for using same
CHEIL IND INC25 citations92
US7514199B2Apr 7, 2009
Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same
CHEIL IND INC12 citations84
US7862990B2Jan 4, 2011
Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer
CHEIL IND INC12 citations83
US7655386B2Feb 2, 2010
Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device
CHEIL IND INC9 citations83
US7632622B2Dec 15, 2009
Antireflective hardmask composition and methods for using same
CHEIL IND INC8 citations80
US7829638B2Nov 9, 2010
Antireflective hardmask composition and methods for using same
CHEIL IND INC4 citations62
US7659051B2Feb 9, 2010
Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer
CHEIL IND INC4 citations62
US7629260B2Dec 8, 2009
Organosilane hardmask compositions and methods of producing semiconductor devices using the same
CHEIL IND INC4 citations62
US7405029B2Jul 29, 2008
Antireflective hardmask composition and methods for using same
CHEIL IND INC5 citations62
US7879526B2Feb 1, 2011
Hardmask compositions for resist underlayer films
CHEIL IND INC0 citations52
DONGJIN SEMICHEM CO LTD
7 patentsUS6579668B1Jun 17, 2003
Photoresist remover composition
DONGJIN SEMICHEM CO LTD24 citations91
US6183942B1Feb 6, 2001
Thinner composition for removing spin-on-glass and photoresist
DONGJIN SEMICHEM CO LTD25 citations90
US6140027AOct 31, 2000
Photoresist remover composition
DONGJIN SEMICHEM CO LTD42 citations90
US7015183B2Mar 21, 2006
Resist remover composition
DONGJIN SEMICHEM CO LTD8 citations72
US6774097B2Aug 10, 2004
Resist stripper composition
DONGJIN SEMICHEM CO LTD7 citations71
US6683034B1Jan 27, 2004
Stripper composition for negative chemically amplified resist
DONGJIN SEMICHEM CO LTD2 citations61
US6908892B2Jun 21, 2005
Photoresist remover composition
DONGJIN SEMICHEM CO LTD5 citations60
YOON KYONG HO
2 patentsUS8445187B2May 21, 2013
Hardmask composition having antireflective properties and method of patterning material on substrate using the same
YOON KYONG HO16 citations91
US8263321B2Sep 11, 2012
Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer
YOON KYONG HO4 citations60