P

Inventor

CHANG CHIH-KUNG

TW36 patents
⚠️ This page may combine multiple inventors who share the name “CHANG CHIH-KUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

16 patents
US11276716B2Mar 15, 2022

Image sensor with improved near-infrared (NIR) radiation phase-detection autofocus (PDAF) performance

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations86
US10367023B1Jul 30, 2019

Semiconductor image sensor

TAIWAN SEMICONDUCTOR MFG CO LTD11 citations84
US11923386B2Mar 5, 2024

Image sensor with improved near-infrared (NIR) radiation phase-detection autofocus (PDAF) performance

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11670647B2Jun 6, 2023

Image sensor with improved near-infrared (NIR) radiation phase-detection autofocus (PDAF) performance

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11158662B2Oct 26, 2021

Semiconductor image sensor

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10510795B1Dec 17, 2019

Semiconductor image sensor

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US12356750B2Jul 8, 2025

Deep trench isolation for cross-talk reduction

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations64
US12199128B2Jan 14, 2025

Wavelength tunable narrow band filter

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11404468B2Aug 2, 2022

Wavelength tunable narrow band filter

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12278249B2Apr 15, 2025

Wave guide filter for semiconductor imaging devices

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11862650B2Jan 2, 2024

Wave guide filter for semiconductor imaging devices

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11233081B2Jan 25, 2022

Wave guide filter for semiconductor imaging devices

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12527106B2Jan 13, 2026

Multi-chip image sensor

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12211871B2Jan 28, 2025

Image sensor with scattering structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12148783B2Nov 19, 2024

Reduced cross-talk in color and infrared image sensor

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US11862654B2Jan 2, 2024

Trench isolation structure for image sensors

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51

TAIWAN SEMICONDUCTOR MFG

15 patents
US6395576B1May 28, 2002

High efficiency color filter process to improve color balance in semiconductor array imaging devices

TAIWAN SEMICONDUCTOR MFG89 citations97
US6964916B2Nov 15, 2005

Image sensor fabrication method and structure

TAIWAN SEMICONDUCTOR MFG20 citations92
US6531266B1Mar 11, 2003

Rework procedure for the microlens element of a CMOS image sensor

TAIWAN SEMICONDUCTOR MFG32 citations92
US6849533B2Feb 1, 2005

Method for fabricating microelectronic product with attenuated bond pad corrosion

TAIWAN SEMICONDUCTOR MFG25 citations91
US6590239B2Jul 8, 2003

Color filter image array optoelectronic microelectronic fabrication with a planarizing layer formed upon a concave surfaced color filter region

TAIWAN SEMICONDUCTOR MFG31 citations90
US7264976B2Sep 4, 2007

Advance ridge structure for microlens gapless approach

TAIWAN SEMICONDUCTOR MFG19 citations82
US7505206B2Mar 17, 2009

Microlens structure for improved CMOS image sensor sensitivity

TAIWAN SEMICONDUCTOR MFG14 citations81
US6861207B2Mar 1, 2005

Method for fabricating microlens with lithographic process

TAIWAN SEMICONDUCTOR MFG12 citations81
US6878642B1Apr 12, 2005

Method to improve passivation openings by reflow of photoresist to eliminate tape residue

TAIWAN SEMICONDUCTOR MFG9 citations74
US7507598B2Mar 24, 2009

Image sensor fabrication method and structure

TAIWAN SEMICONDUCTOR MFG6 citations72
US7071032B2Jul 4, 2006

Material to improve image sensor yield during wafer sawing

TAIWAN SEMICONDUCTOR MFG5 citations62
US6759276B1Jul 6, 2004

Material to improve CMOS image sensor yield during wafer sawing

TAIWAN SEMICONDUCTOR MFG4 citations62
US6671396B1Dec 30, 2003

Method to monitor stepper lens quality in color filter process

TAIWAN SEMICONDUCTOR MFG6 citations56
US6660641B1Dec 9, 2003

Method for forming crack resistant planarizing layer within microelectronic fabrication

TAIWAN SEMICONDUCTOR MFG0 citations51
US7704778B2Apr 27, 2010

Microlens structure for image sensors

TAIWAN SEMICONDUCTOR MFG1 citations50

VISERA TECHNOLOGIES CO LTD

2 patents

WENG FU-TIEN

1 patent

Chen hao-min

1 patent

JIENG TAI INT ELECTRONIC CORP

1 patent