Inventor
SON SEUNG-YOUNG
KR14 patents
⚠️ This page may combine multiple inventors who share the name “SON SEUNG-YOUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
9 patentsUS6867096B2Mar 15, 2005
Method of fabricating semiconductor device having capacitor
SAMSUNG ELECTRONICS CO LTD16 citations92
US7291531B2Nov 6, 2007
Method of fabricating semiconductor device having capacitor
SAMSUNG ELECTRONICS CO LTD4 citations73
US7226867B2Jun 5, 2007
Method of etching a metal layer using a mask, a metallization method for a semiconductor device, a method of etching a metal layer, and an etching gas
SAMSUNG ELECTRONICS CO LTD7 citations73
US7098135B2Aug 29, 2006
Semiconductor device including bit line formed using damascene technique and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD9 citations73
US6927126B2Aug 9, 2005
Method of manufacturing semiconductor device with interconnections and interconnection contacts and a device formed thereby
SAMSUNG ELECTRONICS CO LTD8 citations73
US6753221B2Jun 22, 2004
Methods for fabricating semiconductor devices having capacitors
SAMSUNG ELECTRONICS CO LTD7 citations73
US7256143B2Aug 14, 2007
Semiconductor device having self-aligned contact plug and method for fabricating the same
SAMSUNG ELECTRONICS CO LTD0 citations52
US7736970B2Jun 15, 2010
Method of fabricating semiconductor device having capacitor
SAMSUNG ELECTRONICS CO LTD0 citations51
US7307703B2Dec 11, 2007
Methods of determining an etching end point based on compensation for etching disturbances
SAMSUNG ELECTRONICS CO LTD0 citations50
APPLIED MATERIALS INC
3 patentsUS9653311B1May 16, 2017
3D NAND staircase CD fabrication utilizing ruthenium material
APPLIED MATERIALS INC12 citations81
US12255055B2Mar 18, 2025
Integrated cleaning process for substrate etching
APPLIED MATERIALS INC0 citations61
US11521838B2Dec 6, 2022
Integrated cleaning process for substrate etching
APPLIED MATERIALS INC0 citations61