Inventor
PETERSON CHAD
US6 patents
Patents
6 patentsUS7501355B2Mar 10, 2009
Decreasing the etch rate of silicon nitride by carbon addition
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US11332827B2May 17, 2022
Gas distribution plate with high aspect ratio holes and a high hole density
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US7951730B2May 31, 2011
Decreasing the etch rate of silicon nitride by carbon addition
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US7851384B2Dec 14, 2010
Method to mitigate impact of UV and E-beam exposure on semiconductor device film properties by use of a bilayer film
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US6667248B2Dec 23, 2003
Low-bias-deposited high-density-plasma chemical-vapor-deposition silicate glass layers
APPLIED MATERIALS INC6 citations62
US11111582B2Sep 7, 2021
Porous showerhead for a processing chamber
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