Inventor
HOTZEL ARTHUR
DE13 patents
⚠️ This page may combine multiple inventors who share the name “HOTZEL ARTHUR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOTZEL ARTHUR
7 patentsUS8551677B2Oct 8, 2013
Lithographic CD correction by second exposure
HOTZEL ARTHUR5 citations70
US9075934B2Jul 7, 2015
Reticle defect correction by second exposure
HOTZEL ARTHUR2 citations60
US8574795B2Nov 5, 2013
Lithographic CD correction by second exposure
HOTZEL ARTHUR2 citations60
US8785112B2Jul 22, 2014
Reticle defect correction by second exposure
HOTZEL ARTHUR1 citations49
US8681310B2Mar 25, 2014
Mechanical fixture of pellicle to lithographic photomask
HOTZEL ARTHUR1 citations49
US8518189B2Aug 27, 2013
Vapor clean for haze and particle removal from lithographic photomasks
HOTZEL ARTHUR1 citations49
US9091943B2Jul 28, 2015
Asymmetric reticle heating of multilayer reticles eliminated by dummy exposures and related methods
HOTZEL ARTHUR1 citations45
GLOBALFOUNDRIES INC
4 patentsUS9653367B2May 16, 2017
Methods including a processing of wafers and spin coating tool
GLOBALFOUNDRIES INC4 citations68
US9005882B2Apr 14, 2015
Reticle defect correction by second exposure
GLOBALFOUNDRIES INC0 citations50
US10161915B2Dec 25, 2018
In-situ contactless monitoring of photomask pellicle degradation
GLOBALFOUNDRIES INC1 citations46
US9798244B2Oct 24, 2017
Methods, apparatus, and systems for minimizing defectivity in top-coat-free lithography and improving reticle CD uniformity
GLOBALFOUNDRIES INC0 citations33