P

Inventor

ASAI SATOSHI

JP63 patents
⚠️ This page may combine multiple inventors who share the name “ASAI SATOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SONY CORP

16 patents
USD776717SJan 17, 2017

Display panel or screen with graphical user interface

SONY CORP69 citations98
USD750118SFeb 23, 2016

Display screen with transitional graphical user interface

SONY CORP58 citations98
USD789381SJun 13, 2017

Display panel or screen with graphical user interface

SONY CORP60 citations97
USD736815SAug 18, 2015

Portion of display panel or screen with an icon

SONY CORP65 citations97
USD674809SJan 22, 2013

Display panel or screen with graphical user interface

SONY CORP59 citations97
USD812623SMar 13, 2018

Display panel with graphical user interface

SONY CORP72 citations95
USD771703SNov 15, 2016

Portion of display panel or screen with icon

SONY CORP78 citations95
USD786931SMay 16, 2017

Portion of a display panel or screen with graphical user interface

SONY CORP44 citations94
USD920991SJun 1, 2021

Display screen with transitional graphical user interface

SONY CORP24 citations92
USD838277SJan 15, 2019

Display panel or screen with a graphical user interface

SONY CORP7 citations84
USD736254SAug 11, 2015

Display panel or screen with an icon

SONY CORP13 citations84
USD810780SFeb 20, 2018

Portion of display panel or screen with icon

SONY CORP7 citations82
USD918256SMay 4, 2021

Portion of a display panel or screen with a graphical user interface

SONY CORP4 citations73
USD796521SSep 5, 2017

Portion of a display panel with an icon

SONY CORP3 citations73
US11450352B2Sep 20, 2022

Image processing apparatus and image processing method

SONY CORP0 citations61
US10284832B2May 7, 2019

Image processing apparatus, image processing method, and program

SONY CORP0 citations51

SHINETSU CHEMICAL CO

16 patents
US7785766B2Aug 31, 2010

Silphenylene-bearing polymer, photo-curable resin composition, patterning process, and substrate circuit protective film

SHINETSU CHEMICAL CO36 citations93
US7060761B2Jun 13, 2006

Epoxy resin compositions

SHINETSU CHEMICAL CO12 citations84
US6899991B2May 31, 2005

Photo-curable resin composition, patterning process, and substrate protecting film

SHINETSU CHEMICAL CO13 citations84
US6867325B2Mar 15, 2005

Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate-protecting coat

SHINETSU CHEMICAL CO10 citations74
US10319653B2Jun 11, 2019

Semiconductor apparatus, stacked semiconductor apparatus, encapsulated stacked-semiconductor apparatus, and method for manufacturing the same

SHINETSU CHEMICAL CO3 citations73
US9122158B2Sep 1, 2015

Photo-curable resin composition, photo-curable dry film, patterning process, protective film, and electric/electronic part

SHINETSU CHEMICAL CO5 citations73
US9012111B2Apr 21, 2015

Photo-curable resin composition, photo-curable dry film, patterning process, protective film, and electric/electronic part

SHINETSU CHEMICAL CO6 citations73
US10416557B2Sep 17, 2019

Method for manufacturing semiconductor apparatus, method for manufacturing flip-chip type semiconductor apparatus, semiconductor apparatus, and flip-chip type semiconductor apparatus

SHINETSU CHEMICAL CO2 citations72
US6749643B2Jun 15, 2004

Method of dry cleaning and dry cleaning solvent therefor

SHINETSU CHEMICAL CO3 citations63
US10416559B2Sep 17, 2019

Film material and pattern forming process

SHINETSU CHEMICAL CO1 citations62
US6596892B2Jul 22, 2003

Preparation of low molecular weight branched siloxanes

SHINETSU CHEMICAL CO3 citations61
US10948823B2Mar 16, 2021

Laminate and pattern forming method

SHINETSU CHEMICAL CO0 citations52
US10514601B2Dec 24, 2019

Chemically amplified positive resist film laminate and pattern forming process

SHINETSU CHEMICAL CO0 citations52
US10141272B2Nov 27, 2018

Semiconductor apparatus, stacked semiconductor apparatus and encapsulated stacked-semiconductor apparatus each having photo-curable resin layer

SHINETSU CHEMICAL CO1 citations52
US12493244B2Dec 9, 2025

Photosensitive resin composition, photosensitive dry film, and pattern formation method

SHINETSU CHEMICAL CO0 citations51
US11460774B2Oct 4, 2022

Photosensitive resin composition, photosensitive dry film, and pattern forming process

SHINETSU CHEMICAL CO0 citations51

ASAI SATOSHI

6 patents

KYOCERA CORP

3 patents

OKUMURA MITSUO

2 patents

SONY GROUP CORP

2 patents

IKEDA TAKUO

1 patent

SAKATA JUNICHIROU

1 patent

TAKEDA TAKANOBU

1 patent

OHASHI YASUTAKA

1 patent

SHIH ETSU CHEMICAL CO LTD

1 patent

Showing the top 50 of 63 patents by PatentIndex Score.