P

Inventor

RUCKERT HANS

DE22 patents
⚠️ This page may combine multiple inventors who share the name “RUCKERT HANS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HOECHST AG

19 patents
US4311782AJan 19, 1982

Radiation-sensitive mixture and process for the production of relief images

HOECHST AG59 citations96
US4247611AJan 27, 1981

Positive-working radiation-sensitive copying composition and method of using to form relief images

HOECHST AG105 citations95
US4101323AJul 18, 1978

Radiation-sensitive copying composition

HOECHST AG87 citations93
US4966828AOct 30, 1990

Carbonylmethylene-heterocyclic compounds containing trihalogenomethyl groups, process for their preparation, and light-sensitive mixture containing the compounds

HOECHST AG31 citations92
US4506006AMar 19, 1985

Process for preparing relief images in imaged irradiated light-sensitive material having acid-cleavable compound by hot air treatment, overall irradiation and alkaline development

HOECHST AG40 citations92
US4506003AMar 19, 1985

Positive-working radiation-sensitive mixture

HOECHST AG42 citations92
US4266001AMay 5, 1981

Light-sensitive mixture

HOECHST AG35 citations92
US4250247AFeb 10, 1981

Acid degradable radiation-sensitive mixture

HOECHST AG32 citations89
US4789619ADec 6, 1988

Positive-working radiation-sensitive mixture comprising a sensitizing polymethine dye

HOECHST AG26 citations86
US4764450AAug 16, 1988

Positive-working radiation-sensitive coating solution and positive photoresist material with monomethyl ether of 1,2-propanediol as solvent

HOECHST AG19 citations78
US4093464AJun 6, 1978

Light sensitive o-quinone diazide containing transfer composition

HOECHST AG22 citations78
US4409314AOct 11, 1983

Light-sensitive compounds, light-sensitive mixture, and light-sensitive copying material prepared therefrom

HOECHST AG9 citations74
US4021243AMay 3, 1977

Diazo light-sensitive copying composition and process of using in the manufacture of screen printing stencils

HOECHST AG10 citations73
US4401520AAug 30, 1983

Process for the preparation of screen printing stencils by an electroplating method

HOECHST AG16 citations71
US4853314AAug 1, 1989

Positive-working radiation-sensitive coating solution and positive photoresist material with monoalkyl ether of 1,2-propanediol as solvent

HOECHST AG13 citations70
US5015554AMay 14, 1991

Positive radiation-sensitive mixture

HOECHST AG17 citations69
US4144067AMar 13, 1979

Light-sensitive copying material and method for the production of colored relief images

HOECHST AG11 citations66
US4983501AJan 8, 1991

Positive-working radiation-sensitive composition and radiation-sensitive recording material prepared therewith

HOECHST AG5 citations63
US4619885AOct 28, 1986

Photopolymerizable composition comprising a 1,3,10-triazaanthracen-4-one as the photoinitiator

HOECHST AG6 citations63

MORTON INT INC

2 patents

WESTFAEL ELEKT WERKE

1 patent