Inventor

AQAD EMAD

US47 patents

⚠️ This page may combine multiple inventors who share the name “AQAD EMAD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

AQAD EMAD

ROHM & HAAS ELECT MAT

Iodine-containing polymers for chemically amplified resist compositions

Photoacid generator, photoresist, coated substrate, and method of forming an electronic device

Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an article

Photoacid generator and photoresist comprising same

Photoacid generators, photoresist compositions, and pattern formation methods

Iodine-containing polymers for chemically amplified resist compositions

Iodine-containing photoacid generators and compositions comprising the same

Methods of forming electronic devices including filling porous features with a polymer

Photoacid generator, photoresist, coated substrate, and method of forming an electronic device

Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device

Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition

Salts and photoresists comprising same

Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition

Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device

Zwitterion compounds and photoresists comprising same

Salts and photoresists comprising same

Photoacid generator, photoresist, coated substrate, and method of forming an electronic device

Photoacid generator and photoresist comprising same

Photoresist compositions and methods

Monomers, polymers and lithographic compositions comprising same

Resins for underlayers

Aromatic resins for underlayers

Acid generators and photoresists comprising same

Cholate photoacid generators and photoresists comprising same

Photoacid generator

Photoacid generator

Photoacid-generating compound, polymer derived therefrom, photoresist composition including the photoacid-generating compound or polymer, and method of forming a photoresist relief image

Photoacid generator and photoresist comprising same

Photoresist compositions and pattern formation methods

Photoresist compositions and pattern formation methods

Acid-cleavable monomer and polymers including the same

Photoacid-generating compound and associated polymer, photoresist composition, and method of forming a photoresist relief image

Dendritic compounds, photoresist compositions and methods of making electronic devices

AQAD EMAD

Base reactive photoacid generators and photoresists comprising same

Photoacid generators and photoresists comprising same

Cholate photoacid generators and photoresists comprising same

Lactone photoacid generators and resins and photoresists comprising same

Polymers and photoresist compositions

LI MINGQI

Photoresist composition

Photoacid generators and photoresists comprising same

Photoacid generators and photoresists comprising same

THACKERAY JAMES W

Photosensitive compositions

Photosensitive copolymer and photoresist composition

DUPONT ELECTRONIC MAT INTERNATIONAL LLC

Photoacid generators, photoresist compositions, and pattern formation methods

Underlayer compositions and patterning methods

ROHM & HAAS ELECT MATERIALS KOREA LTD

Method for forming pattern using antireflective coating composition including photoacid generator

Coating composition for use with an overcoated photoresist