Inventor

XU CHENG-BAI

US69 patents

⚠️ This page may combine multiple inventors who share the name “XU CHENG-BAI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

XU CHENG-BAI

ROHM & HAAS ELECT MAT

Photoresist pattern trimming methods

Photoacid generator, photoresist, coated substrate, and method of forming an electronic device

Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an article

Photoacid generator and photoresist comprising same

Sulfonyl photoacid generators and photoresists comprising same

Acid generator compounds and photoresists comprising same

Photoresist pattern trimming methods

Methods of forming electronic devices including filling porous features with a polymer

Gap-fill methods

Photoresists comprising carbamate component

Photoresist pattern trimming methods

Pattern trimming methods

Ionic thermal acid generators for low temperature applications

Ion implantation methods

Multiple-pattern forming methods

Gap-fill methods

Photoacid generator, photoresist, coated substrate, and method of forming an electronic device

Photoacid generator, photoresist, coated substrate, and method of forming an electronic device

Photoacid generator and photoresist comprising same

Photoresist pattern trimming compositions and pattern formation methods

Photoresist topcoat compositions and methods of processing photoresist compositions

Photoresist pattern trimming compositions and pattern formation methods

Photoresists comprising amide component

Compositions comprising sulfonamide material and processes for photolithography

Photoresists comprising ionic compound

Compositions and processes for immersion lithography

Photoresist comprising nitrogen-containing compound

Acid generators and photoresists comprising same

Cycloaliphatic monomer, polymer comprising the same, and photoresist composition comprising the polymer

Photoresist systems

Cholate photoacid generators and photoresists comprising same

Pattern-formation methods

Photoresist topcoat compositions and methods of processing photoresist compositions

WANG DEYAN

Compositions and processes for immersion lithography

Compositons and processes for immersion lithography

Surface active additive and photoresist composition comprising same

Compositions comprising base-reactive component and processes for photolithography

Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography

Compositions comprising sulfonamide material and processes for photolithography

Compositions comprising carboxy component and processes for photolithography

Compositions and processes for photolithography

AQAD EMAD

Base reactive photoacid generators and photoresists comprising same

Photoacid generators and photoresists comprising same

Cholate photoacid generators and photoresists comprising same

LI MINGQI

Photoresist composition

Photoacid generators and photoresists comprising same

LIU CONG

Sulfonyl photoacid generators and photoresists comprising same

ROHM AND HAAS ELECTRIC MATERIA

Photoresist compositions comprising resin blends

Rohm and Hass Electronic Materials LLC

Photoresist and coated substrate comprising same

PROKOPOWICZ GREGORY P

Polymer composition and photoresist comprising the polymer