P

Inventor

SHIN ILGYOU

KR13 patents

Patents

13 patents
US11362182B2Jun 14, 2022

Semiconductor device including superlattice pattern

SAMSUNG ELECTRONICS CO LTD14 citations93
US11322583B2May 3, 2022

Semiconductor device including barrier layer between active region and semiconductor layer and method of forming the same

SAMSUNG ELECTRONICS CO LTD1 citations71
US12328937B2Jun 10, 2025

Integrated circuit devices and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12256564B2Mar 18, 2025

Semiconductor device having a liner layer and method of fabricating the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12166081B2Dec 10, 2024

Semiconductor device-including source and drain regions and superlattice pattern having a pillar shape

SAMSUNG ELECTRONICS CO LTD0 citations62
US11888028B2Jan 30, 2024

Semiconductor device having a liner layer and method of fabricating the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US11791400B2Oct 17, 2023

Semiconductor device

SAMSUNG ELECTRONICS CO LTD0 citations62
US11777001B2Oct 3, 2023

Semiconductor device including superlattice pattern

SAMSUNG ELECTRONICS CO LTD0 citations62
US11626401B2Apr 11, 2023

Integrated circuit devices and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US11417731B2Aug 16, 2022

Semiconductor device including a field effect transistor and method of fabricating the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US11201087B2Dec 14, 2021

Semiconductor device

SAMSUNG ELECTRONICS CO LTD0 citations62
US12453141B2Oct 21, 2025

Semiconductor device including barrier layer between active region and semiconductor layer and method of forming the same

SAMSUNG ELECTRONICS CO LTD0 citations60
US11996443B2May 28, 2024

Semiconductor device including barrier layer between active region and semiconductor layer and method of forming the same

SAMSUNG ELECTRONICS CO LTD0 citations60