Inventor

RENAU ANTHONY

US71 patents

⚠️ This page may combine multiple inventors who share the name “RENAU ANTHONY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

RENAU ANTHONY

VARIAN SEMICONDUCTOR EQUIPMENT

Control system for indirectly heated cathode ion source

Methods and apparatus for adjusting beam parallelism in ion implanters

Acceleration and analysis architecture for ion implanter

High transmission, low energy beamline architecture for ion implanter

Bi mode ion implantation with non-parallel ion beams

Adjustable conductance limiting aperture for ion implanters

Acceleration and analysis architecture for ion implanter

Methods and apparatus for alignment of ion beam systems using beam current sensors

Apparatus and method for controllably implanting workpieces

Uniformity control multiple tilt axes, rotating wafer and variable scan velocity

Angled ion beam processing of heterogeneous structure

In situ control of ion angular distribution in a processing apparatus

Technique for shaping a ribbon-shaped ion beam

Techniques for forming shallow junctions

Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atoms

Cathode assembly for indirectly heated cathode ion source

Uniformity control using multiple fixed wafer orientations and variable scan velocity

Method and system for compensating for anneal non-uniformities

Ion beam neutral detection

Electron injection in ion implanter magnets

Methods and apparatus for adjusting beam parallelism in ion implanters

Techniques for controlling a charged particle beam

Implanting with improved uniformity and angle control on tilted wafers

Multi-purpose electrostatic lens for an ion implanter system

Technique for improving ion implantation throughput and dose uniformity

Electron confinement inside magnet of ion implanter

VARIAN SEMICONDUCTOR EQUIPMENT ASS INC

System and methods using an inline surface engineering source

High brightness ion beam extraction using bias electrodes and magnets proximate the extraction aperture

Apparatus and method for generating high current negative hydrogen ion beam

Extreme edge uniformity control

In situ control of ion angular distribution in a processing apparatus

Method for selectively depositing a layer on a three dimensional structure

System and methods using an inline surface engineering source

Extreme edge uniformity control

Performance improvement of EUV photoresist by ion implantation

Device structure for forming semiconductor device having angled contacts

Device structure for forming semiconductor device having angled contacts

APPLIED MATERIALS INC

System and methods for wafer charge reduction for ion implantation

System, apparatus and method for bunched ribbon ion beam

Gate all around device and method of formation using angled ions

Apparatus, system and method for energy spread ion beam

Gate all around device and method of formation using angled ions

Apparatus, system and method for energy spread ion beam

Apparatus and techniques for substrate processing using independent ion source and radical source

Gate devices and methods of formation using angled ions

GODET LUDOVIC

Plasma processing apparatus

Technique and apparatus for monitoring ion mass, energy, and angle in processing systems

Plasma processing apparatus

DIAMOND SEMICONDUCTOR GROUP

Compact high current broad beam ion implanter

RENAU ANTHONY

Apparatus and method for multiple slot ion implantation